Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System
文献类型：期刊论文
| 作者 | Wang, W.; S. Jiang; Y. Song and Bayanheshig |
| 刊名 | Zhongguo Jiguang/Chinese Journal of Lasers
 |
| 出版日期 | 2017 |
| 卷号 | 44期号:9 |
| 英文摘要 | In a scanning beam interference lithography (SBIL) system, the exposure spot size has significant influence on the stitching accuracy of interference fringes, efficiency of grating fabrication and quality of interference field. In order to obtain a reasonable exposure spot size, the influence of exposure spot size on nonlinear error of interference fringe, line stitching error and exposure contrast is discussed by numerical simulation based on the transmission law of Gaussian beam and scanning stitching mathematical model. Results show that, compared with the large-sized spot, the small exposure spot is more conducive to controlling nonlinear error of interference fringe. Because there exists periodic measurement error, a small exposure spot helps to reduce the line error after stitching and enhance the exposure contrast. The exposure optical path of SBIL system is designed and optimized. The left and right spot morphologies of interference field and the nonlinear error of interference fringe phase are measured. Results show that the waist radius of exposure spot is about 0.9 mm, and the nonlinear error peak-valley value of interference fringe phase is 21.8 nm. 2017, Chinese Lasers Press. All right reserved. |
| 语种 | 中文 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/59278]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | Wang, W.,S. Jiang,Y. Song and Bayanheshig. Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2017,44(9). |
| APA | Wang, W.,S. Jiang,&Y. Song and Bayanheshig.(2017).Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System.Zhongguo Jiguang/Chinese Journal of Lasers,44(9). |
| MLA | Wang, W.,et al."Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System".Zhongguo Jiguang/Chinese Journal of Lasers 44.9(2017). |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。