Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography
文献类型：期刊论文
| 作者 | Xue, C. F.; J. Zhao; Y. Q. Wu; H. N. Yu; S. M. Yang; L. S. Wang; W. C. Zhao; Q. Wu; Z. C. Zhu; B. Liu |
| 刊名 | Applied Surface Science
 |
| 出版日期 | 2017 |
| 卷号 | 425 |
| 英文摘要 | Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved. |
| 语种 | 英语 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/59361]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | Xue, C. F.,J. Zhao,Y. Q. Wu,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. Applied Surface Science,2017,425. |
| APA | Xue, C. F..,J. Zhao.,Y. Q. Wu.,H. N. Yu.,S. M. Yang.,...&W. C. Zhou and R. Z. Tai.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.Applied Surface Science,425. |
| MLA | Xue, C. F.,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".Applied Surface Science 425(2017). |
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