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Two-dimensional hexagonal symmetry diffraction pattern by SiO2 photonic structures fabricated by hot embossing

文献类型：期刊论文

作者Guo, Shuai1; Wang, Liangwei2; Zhao, Fangyin1; Li, An1; Liang, Liang1; Chai, Ke1; Li, Ya1; Liu, Ruibin1
刊名FUNCTIONAL MATERIALS LETTERS
出版日期2017-06-01
卷号10期号:3
关键词Sol-gel Nanoimprint Resist Sio2 Cylindrical And Stripe Photonic Structures Hexagonal Symmetry Diffraction Pattern
DOI10.1142/S179360471750031X
文献子类Article
英文摘要Using synthesized sol-gel nanoimprint resist, large-area, ordered SiO2 cylindrical and stripe photonic nanostructures with constant aspect ratio have been fabricated by a single-step soft stamp hot embossing nanoimprint. Different from the traditional hot embossing nanoimprint technique, in our imprint process, the external force applied to the soft stamp is provided just by using our hand. Since the stress can be well released, the stamp can be easily released after the hot stage cooling down. So the optical window (K9 glass) substrates with imprinted two-dimensional SiO2 cylindrical photonic nanostructures show good light diffraction property. Also, our experiment demonstrates that with the imprinted sample annealing at 200 degrees C, the density of SiO2 will be increased and the diffraction efficiency can be further enhanced. In addition, the light splitting characteristic can still keep good for a larger (6 inch) substrate, which has a certain radian. This illustrates that this nanoimprint method can be compatible with the fluctuation of the imprinted substrates. Furthermore, as the distance between two adjacent feature nanostructures is in sub-micro scale, hexagonal symmetry diffraction pattern by the cylindrical photonic structures was realized at normal incidence of monochromatic laser (lambda =532 nm). The diffraction efficiency of first order is about 11.2%. Morever, the diffraction pattern and the intensity of the first diffraction order can be modulated just by changing the incident angle of the input laser.
WOS关键词LITHOGRAPHY ; SILICON
WOS研究方向Materials Science
语种英语
WOS记录号WOS:000404732900023
资助机构National Natural Science Foundation of China(61574017) ; National Natural Science Foundation of China(61574017) ; National Natural Science Foundation of China(61574017) ; National Natural Science Foundation of China(61574017)
源URL[http://ir.wipm.ac.cn/handle/112942/11469]  
专题武汉物理与数学研究所_磁共振基础研究部
作者单位1.Beijing Inst Technol, Inst Phys, Beijing 100081, Peoples R China
2.Chinese Acad Sci, Wuhan Inst Phys & Math, Wuhan 430071, Peoples R China
推荐引用方式
GB/T 7714		 Guo, Shuai,Wang, Liangwei,Zhao, Fangyin,et al. Two-dimensional hexagonal symmetry diffraction pattern by SiO2 photonic structures fabricated by hot embossing[J]. FUNCTIONAL MATERIALS LETTERS,2017,10(3).
APA Guo, Shuai.,Wang, Liangwei.,Zhao, Fangyin.,Li, An.,Liang, Liang.,...&Liu, Ruibin.(2017).Two-dimensional hexagonal symmetry diffraction pattern by SiO2 photonic structures fabricated by hot embossing.FUNCTIONAL MATERIALS LETTERS,10(3).
MLA Guo, Shuai,et al."Two-dimensional hexagonal symmetry diffraction pattern by SiO2 photonic structures fabricated by hot embossing".FUNCTIONAL MATERIALS LETTERS 10.3(2017).

入库方式： OAI收割

来源：武汉物理与数学研究所

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