中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Controlled Growth of Heterostructured Ga/GaAs Nanowires with Sharp Schottky Barrier

文献类型:期刊论文

作者Wang, Zhou1,2; Wang, Ying1,3; Zhou, Xinyuan1; Yang, Zaixing4,5; Yin, Yanxue4,5; Zhang, Jie2; Han, Ning1,3; Ho, Johnny C.6; Chen, Yunfa1,3
刊名CRYSTAL GROWTH & DESIGN
出版日期2018-08-01
卷号18期号:8页码:4438-4444
ISSN号1528-7483
DOI10.1021/acs.cgd.8b00409
英文摘要

Because of the inevitable Fermi level pinning on surface/interface states of nanowires, achieving high-performance nanowire devices with controllable nanoscale contacts is always challenging but important. Herein, single-crystalline heterostructured Ga/GaAs nanowires with sharp hetero-Schottky interfaces have been successfully synthesized on amorphous substrates by utilizing Au nanoparticles as catalytic seeds via chemical vapor deposition. These nanowires are found to grow with the hemispherical Au7Ga2 catalytic tips following the vapor-liquid-solid mechanism. During the growth, simply by manipulating the source and growth temperatures, the Ga precipitation rate from Au-Ga alloy tips as well as the reaction rate of Ga precipitates with As can be reliably controlled in order to tailor the length (0-170 nm) of Ga nanowire segments obtained in the heterostructure. When configured into field-effect transistors, these Ga/GaAs NWs exhibit the p-type conductivity with a sharp hetero-Schottky barrier of similar to 1.0 eV at the atomically connected Ga segment/ GaAs NW body interface, in which this barrier height is close to the theoretical difference between the GaAs Fermi level (5.15.3 eV) and the Ga work function (similar to 4.3 eV), suggesting the effective formation of nanoscale contact by minimizing the Fermi level pinning, being advantageous for advanced nanoelectronics.

WOS关键词Gaas Nanowires ; Electronic Transport ; Interface ; Mechanism ; Diffusion ; Contacts ; Quality ; Photovoltaics ; Photonics ; Silicon
资助项目National Natural Science Foundation of China[61504151] ; National Natural Science Foundation of China[51602314] ; National Natural Science Foundation of China[51672229] ; National Key R&D Program of China[2016YFC0207100] ; National Key R&D Program of China[2017YFA0305500] ; Research Grants Council of Hong Kong SAR, China[CityU 11211317] ; Science Technology and Innovation Committee of Shenzhen Municipality[JCYJ20170818095520778] ; CAS-CSIRO project of the Bureau of International Co-operation of Chinese Academy of Sciences[122111KYSB20150064]
WOS研究方向Chemistry ; Crystallography ; Materials Science
语种英语
出版者AMER CHEMICAL SOC
WOS记录号WOS:000440956100031
资助机构National Natural Science Foundation of China ; National Key R&D Program of China ; Research Grants Council of Hong Kong SAR, China ; Science Technology and Innovation Committee of Shenzhen Municipality ; CAS-CSIRO project of the Bureau of International Co-operation of Chinese Academy of Sciences
源URL[http://ir.ipe.ac.cn/handle/122111/25393]  
专题中国科学院过程工程研究所
通讯作者Han, Ning; Ho, Johnny C.
作者单位1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China
2.Beijing Univ Chem Technol, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China
3.Chinese Acad Sci, Ctr Excellence Reg Atmospher Environm, Inst Urban Environm, Xiamen 361021, Peoples R China
4.Shandong Univ, Ctr Nanoelect, Jinan 250100, Shandong, Peoples R China
5.Shandong Univ, Sch Microelect, Jinan 250100, Shandong, Peoples R China
6.City Univ Hong Kong, Dept Mat Sci & Engn, Hong Kong, Hong Kong, Peoples R China
推荐引用方式
GB/T 7714
Wang, Zhou,Wang, Ying,Zhou, Xinyuan,et al. Controlled Growth of Heterostructured Ga/GaAs Nanowires with Sharp Schottky Barrier[J]. CRYSTAL GROWTH & DESIGN,2018,18(8):4438-4444.
APA Wang, Zhou.,Wang, Ying.,Zhou, Xinyuan.,Yang, Zaixing.,Yin, Yanxue.,...&Chen, Yunfa.(2018).Controlled Growth of Heterostructured Ga/GaAs Nanowires with Sharp Schottky Barrier.CRYSTAL GROWTH & DESIGN,18(8),4438-4444.
MLA Wang, Zhou,et al."Controlled Growth of Heterostructured Ga/GaAs Nanowires with Sharp Schottky Barrier".CRYSTAL GROWTH & DESIGN 18.8(2018):4438-4444.

入库方式: OAI收割

来源:过程工程研究所

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