Influence of deposition parameters on residual stress of YbF3 thin film
文献类型：期刊论文
| 作者 | Zhang, Yao-Ping1; Fan, Jun-Qi1; Long, Guo-Yun1 |
| 刊名 | Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015
 |
| 出版日期 | 2016 |
| 卷号 | 9796页码:97960N |
| 关键词 | Adaptive Optics Coatings Deposition Ion Beam Assisted depositIon Monocrystalline Silicon Reflective Coatings Refractive Index Residual Stresses Space Debris Sputtering |
| ISSN号 | 0277-786X |
| DOI | 10.1117/12.2228239 |
| 文献子类 | C |
| 英文摘要 | YbF3was proposed as a substitute for ThF4in anti-reflection or reflection coatings for the infrared range, and the residual stress of YbF3thin film using APS plasma ion assisted deposition(PIAD) was studied. From the results, we found the anode voltage of PIAD has a large effect on the residual stress of YbF3thin film, and the refractive index of YbF3produced with PIAD was higher than without it, with a possible reason close to packing density. Finally, we produced multi-layer reflection coating on a 260mm diameter mono-crystalline silicon substrate. Its surface contour was approximately 0.240λ (λ = 632.8nm), and the absorption was lower than 200ppm, which can satisfy the practical requirement. © 2016 SPIE. |
| 语种 | 英语 |
| WOS记录号 | WOS:000374450700023 |
| 资助机构 | Chinese Academy of Engineering ; Chinese Society for Optical Engineering ; National Natural Science Foundation of China |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/8452]  |
| 专题 | 光电技术研究所_自适应光学技术研究室（八室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China 2.The Key Laboratory on Adaptive Optics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China |
| 推荐引用方式 GB/T 7714 | Zhang, Yao-Ping,Fan, Jun-Qi,Long, Guo-Yun. Influence of deposition parameters on residual stress of YbF3 thin film[J]. Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,2016,9796:97960N. |
| APA | Zhang, Yao-Ping,Fan, Jun-Qi,&Long, Guo-Yun.(2016).Influence of deposition parameters on residual stress of YbF3 thin film.Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,9796,97960N. |
| MLA | Zhang, Yao-Ping,et al."Influence of deposition parameters on residual stress of YbF3 thin film".Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015 9796(2016):97960N. |
入库方式： OAI收割
来源：光电技术研究所
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