Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool
文献类型：期刊论文
| 作者 | Wang, Jia1; Hou, Xi1; Wan, Yongjian1; Shi, Chunyan1; Zhong, Xianyun1 |
| 刊名 | Proceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
 |
| 出版日期 | 2016 |
| 卷号 | 9927页码:99270J |
| 关键词 | Fabrication |
| ISSN号 | 0277-787X |
| DOI | 10.1117/12.2236800 |
| 文献子类 | C |
| 英文摘要 | Extreme optical fabrication projects known as EUV and X-ray optic systems, which are representative of today's advanced optical manufacturing technology level, have special requirements for the optical surface quality. In synchroton radiation (SR) beamlines, mirrors of high shape accuracy is always used in grazing incidence. In nanolithograph systems, middle spatial frequency errors always lead to small-angle scattering or flare that reduces the contrast of the image. The slope error is defined for a given horizontal length, the increase or decrease in form error at the end point relative to the starting point is measured. The quality of reflective optical elements can be described by their deviation from ideal shape at different spatial frequencies. Usually one distinguishes between the figure error, the low spatial error part ranging from aperture length to 1mm frequencies, and the mid-high spatial error part from 1mm to 1 μm and from1 μm to some 10 nm spatial frequencies, respectively. Firstly, this paper will disscuss the relationship between slope error and middle spatial frequency error, which both describe the optical surface error along with the form profile. Then, experimental researches will be conducted on a high gradient precise aspheric with pitch tool, which aim to restraining the middle spatial frequency error. © 2016 SPIE. |
| 语种 | 英语 |
| WOS记录号 | WOS:000390022300012 |
| 资助机构 | The Society of Photo-Optical Instrumentation Engineers (SPIE) |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/8464]  |
| 专题 | 超精密总体部 |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China |
| 推荐引用方式 GB/T 7714 | Wang, Jia,Hou, Xi,Wan, Yongjian,et al. Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool[J]. Proceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII,2016,9927:99270J. |
| APA | Wang, Jia,Hou, Xi,Wan, Yongjian,Shi, Chunyan,&Zhong, Xianyun.(2016).Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool.Proceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII,9927,99270J. |
| MLA | Wang, Jia,et al."Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool".Proceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII 9927(2016):99270J. |
入库方式： OAI收割
来源：光电技术研究所
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