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Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer

文献类型：期刊论文

作者Liu, Ling1; Liu, Kaipeng1; Zhao, Zeyu1; Wang, Changtao1; Gao, Ping1; Luo, Xiangang1
刊名RSC Advances
出版日期2016
卷号6期号:98页码:95973-95978
关键词Diffraction Electric Field Effects Electric Fields Geometry Masks Plasmons Reflection Silver
ISSN号2046-2069
DOI10.1039/c6ra17098f
文献子类J
英文摘要In recent years, hyperlens technology has attracted more attention because of its function of magnification and demagnification. In this study, hyperlens demagnification imaging lithography was experimentally demonstrated with sub-diffraction resolution of about 55 nm line width and about 1.8 demagnification factor at 365 nm. The hyperlens was composed of multiple Ag/SiO2films and combined with a resist layer and a plasmonic Ag reflector. It was employed to project mask patterns to subwavelength images for nanolithography. It was found that the plasmonic reflector contributes remarkably to improving imaging contrast, fidelity and efficiency by inhibiting the negative influences from the radial electric field components in the resist region. Furthermore, discussions about imaging influences with geometrical parameters are also presented. © 2016 The Royal Society of Chemistry.
语种英语
WOS记录号WOS:000385633100073
资助机构973 Program of China [2013CBA01700] ; Chinese Nature Science Grant [61138002, 61307013]
源URL[http://ir.ioe.ac.cn/handle/181551/8478]  
专题光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu
2.610209, China
推荐引用方式
GB/T 7714		 Liu, Ling,Liu, Kaipeng,Zhao, Zeyu,et al. Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer[J]. RSC Advances,2016,6(98):95973-95978.
APA Liu, Ling,Liu, Kaipeng,Zhao, Zeyu,Wang, Changtao,Gao, Ping,&Luo, Xiangang.(2016).Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer.RSC Advances,6(98),95973-95978.
MLA Liu, Ling,et al."Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer".RSC Advances 6.98(2016):95973-95978.

入库方式： OAI收割

来源：光电技术研究所

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