Superresolution nanolithography technique based on polydimethylsiloxane soft mold
文献类型：期刊论文
| 作者 | He, Chuanwang1,2; Dong, Xiaochun1; Wang, Pinghe2 |
| 刊名 | IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO)
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| 出版日期 | 2016 |
| 页码 | 269-272 |
| 关键词 | Electric Fields Linewidth Manufacture Microchannels Molds Nanolithography Nanotechnology Optical Resolving Power Photoresists Pulse Width Modulation Silver |
| ISSN号 | 2373-5422 |
| DOI | 10.1109/3M-NANO.2016.7824990 |
| 文献子类 | C |
| 英文摘要 | We report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given. © 2016 IEEE. |
| 语种 | 英语 |
| WOS记录号 | WOS:000393187700052 |
| 资助机构 | National Natural Science Foundation of China [61007024, 61475159, 61271150] |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/8495]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China 3.School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 4.610054, China |
| 推荐引用方式 GB/T 7714 | He, Chuanwang,Dong, Xiaochun,Wang, Pinghe. Superresolution nanolithography technique based on polydimethylsiloxane soft mold[J]. IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),2016:269-272. |
| APA | He, Chuanwang,Dong, Xiaochun,&Wang, Pinghe.(2016).Superresolution nanolithography technique based on polydimethylsiloxane soft mold.IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),269-272. |
| MLA | He, Chuanwang,et al."Superresolution nanolithography technique based on polydimethylsiloxane soft mold".IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO) (2016):269-272. |
入库方式： OAI收割
来源：光电技术研究所
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