The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features
文献类型:期刊论文
作者 | Liu, Junbo1,2; Zhou, Shaolin3; Yang, Yong2; Hu, Song4; He, Yu4; Chen, Yinghong5 |
刊名 | IEEE Photonics Technology Letters
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出版日期 | 2016 |
卷号 | 28期号:22页码:2529-2532 |
关键词 | Diffraction Frequency Doublers Light Polarization Phase Shift |
ISSN号 | 1041-1135 |
DOI | 10.1109/LPT.2016.2602334 |
文献子类 | J |
英文摘要 | In the case of duplicating periodic features by UV projection lithography, the unwanted phenomenon of periodicity or frequency doubling somehow occurs due to far-field imaging of the near-field diffraction. In this letter, we fundamentally explored the mechanism of frequency or periodicity doubling in an analytical and numerical way, and reconfirm the validity by experiments of projection lithography. In this process, both the Talbot self-image and π-phase-shifted image were synchronously captured to generate the overlapped pattern with doubled periodicity within the depth-of-focus (DOF) area. The Fresnel diffraction theory was used to further derive the relationship between the mask and the objective lens' parameters (i.e., the resolution and DOF). Finally, experimental results showed the self-image and π-phase-shifted image, both clearly recorded on wafer when optical parameters were well adjusted. © 1989-2012 IEEE. |
语种 | 英语 |
WOS记录号 | WOS:000388107000014 |
资助机构 | National Natural Science Foundation of China [61204114, 6274108, 61376110, 61405060] ; science and technology planning project of Guangdong Province [2014A010104005] ; Fundamental Research Funds for the Central Universities of South China University of Technology [2015 ZZ030] ; Opening Project of State Key Laboratory of Polymer Materials Engineering (Sichuan University) [Sklpeme2015-4-28] |
源URL | [http://ir.ioe.ac.cn/handle/181551/8497] ![]() |
专题 | 光电技术研究所_微电子装备总体研究室(四室) |
作者单位 | 1.University of Chinese Academy of Sciences, Beijing 2.100049, China 3.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 4.610209, China 5.School of Electronic and Information Engineering, South China University of Technology, Guangzhou 6.510640, China 7.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 8.610209, China 9.State Key Laboratory of Polymer Materials Engineering, Chengdu 10.610065, China |
推荐引用方式 GB/T 7714 | Liu, Junbo,Zhou, Shaolin,Yang, Yong,et al. The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features[J]. IEEE Photonics Technology Letters,2016,28(22):2529-2532. |
APA | Liu, Junbo,Zhou, Shaolin,Yang, Yong,Hu, Song,He, Yu,&Chen, Yinghong.(2016).The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features.IEEE Photonics Technology Letters,28(22),2529-2532. |
MLA | Liu, Junbo,et al."The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features".IEEE Photonics Technology Letters 28.22(2016):2529-2532. |
入库方式: OAI收割
来源:光电技术研究所
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