High-precision structure fabrication based on an etching resistance layer
文献类型：期刊论文
| 作者 | Zhang, Man1; Deng, Qiling1; Shi, Lifang1; Cao, Axiu1; Pang, Hui1; Liu, Xin1; Wang, Jiazhou1; Hu, Song1 |
| 刊名 | Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
 |
| 出版日期 | 2016 |
| 卷号 | 9683页码:96830C |
| 关键词 | Fabrication Manufacture Photolithography |
| ISSN号 | 0277-786X |
| DOI | 10.1117/12.2245685 |
| 文献子类 | C |
| 英文摘要 | The high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated. © 2016 SPIE. |
| 语种 | 英语 |
| WOS记录号 | WOS:000387745800011 |
| 资助机构 | Chinese Academy of Sciences, Institute of Optics and Electronics (IOE) ; The Chinese Optical Society (COS) |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/8503]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China |
| 推荐引用方式 GB/T 7714 | Zhang, Man,Deng, Qiling,Shi, Lifang,et al. High-precision structure fabrication based on an etching resistance layer[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,2016,9683:96830C. |
| APA | Zhang, Man.,Deng, Qiling.,Shi, Lifang.,Cao, Axiu.,Pang, Hui.,...&Hu, Song.(2016).High-precision structure fabrication based on an etching resistance layer.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,9683,96830C. |
| MLA | Zhang, Man,et al."High-precision structure fabrication based on an etching resistance layer".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies 9683(2016):96830C. |
入库方式： OAI收割
来源：光电技术研究所
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