A new flexible hybrid mask for contact exposure and its fabrication
文献类型：期刊论文
| 作者 | Liu, Xin1; Zhang, Man1; Cao, A-Xiu1; Pang, Hui1; Wang, Jia-Zhou1; Deng, Qi-Ling1 |
| 刊名 | Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
 |
| 出版日期 | 2016 |
| 卷号 | 9685页码:96850Q |
| 关键词 | Elastic Moduli Fabrication Lithography Manufacture Nanostructures Optical Devices Photolithography Photoresists Polymers Printing |
| ISSN号 | 0277-786X |
| DOI | 10.1117/12.2245719 |
| 文献子类 | C |
| 英文摘要 | According to the exposure pattern distortion in contact printing caused by the photoresist and sometimes has a rough surface with impurity particles on it, we propose a new flexible hybrid mask for contact printing. The mask consists of three layers: a flexible polymer buffer layer, a polymer structure layer of high Young's modulus, and a metal masking layer. Because the hybrid mask skillfully combines the characteristics of flexible polymer and high Young's modulus polymer, it has two advantages: high flexibility and high resolution. The flexible hybrid mask can attach closely with the photoresist under the condition of vacuum adsorption. So the fabrication of micro-nano structures with high precision and high resolution can be realized. In this paper, a new flexible hybrid mask with critical dimension of 2um was fabricated. The photoresist structure with high precision was manufactured using this mask by photolithography and it verified the feasibility of the mask for lithography. © 2016 SPIE. |
| 语种 | 英语 |
| WOS记录号 | WOS:000387429600026 |
| 资助机构 | Chinese Academy of Sciences, Institute of Optics and Electronics (IOE) ; The Chinese Optical Society (COS) |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/8508]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China |
| 推荐引用方式 GB/T 7714 | Liu, Xin,Zhang, Man,Cao, A-Xiu,et al. A new flexible hybrid mask for contact exposure and its fabrication[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,2016,9685:96850Q. |
| APA | Liu, Xin,Zhang, Man,Cao, A-Xiu,Pang, Hui,Wang, Jia-Zhou,&Deng, Qi-Ling.(2016).A new flexible hybrid mask for contact exposure and its fabrication.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,9685,96850Q. |
| MLA | Liu, Xin,et al."A new flexible hybrid mask for contact exposure and its fabrication".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials 9685(2016):96850Q. |
入库方式： OAI收割
来源：光电技术研究所
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