UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication
文献类型：期刊论文
| 作者 | Deng, Qian1,2; Liu, Junbo1; Zhou, Shaolin3; Tang, Yan1; Zhao, Lixin1; Hu, Song1; Chen, Yinghong4 |
| 刊名 | Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
 |
| 出版日期 | 2016 |
| 卷号 | 9685页码:96850M |
| 关键词 | Crystal Symmetry Frequency Doublers Lithography Manufacture Microoptics Optical Devices Phase Shift Ultraviolet Spectroscopy |
| ISSN号 | 0277-786X |
| DOI | 10.1117/12.2243456 |
| 文献子类 | C |
| 英文摘要 | The spectrum-integral Talbot lithography (STIL) was introduced into the fabrication of one-dimensional micro gratings using the broad-band UV illumination in this paper. In the process of spectrum-integral Talbot lithography, the self-images and π-phase-shifted images generated by different wave lengths overlap and integrate collectively to enormously extend the continuous depth-of-focus area since a certain distance away from the mask. As a result, the route of STIL proves to be of great potential for periodic frequency-doubling in good contrast without any complex improvement and operation to the traditional proximity lithographic system of UV mask aligner. © 2016 SPIE. |
| 语种 | 英语 |
| WOS记录号 | WOS:000387429600022 |
| 资助机构 | Chinese Academy of Sciences, Institute of Optics and Electronics (IOE) ; The Chinese Optical Society (COS) |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/8512]  |
| 专题 | 光电技术研究所_光电探测与信号处理研究室（五室） |
| 作者单位 | 1.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China 3.University of Chinese Academy of Sciences, Beijing 4.100049, China 5.School of Electronic and Information Engineering, South China University of Technology, Guangzhou 6.510640, China 7.State Key Laboratory of Polymer Materials Engineering(Sichuan University), Chengdu 8.610065, China |
| 推荐引用方式 GB/T 7714 | Deng, Qian,Liu, Junbo,Zhou, Shaolin,et al. UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,2016,9685:96850M. |
| APA | Deng, Qian.,Liu, Junbo.,Zhou, Shaolin.,Tang, Yan.,Zhao, Lixin.,...&Chen, Yinghong.(2016).UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,9685,96850M. |
| MLA | Deng, Qian,et al."UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials 9685(2016):96850M. |
入库方式： OAI收割
来源：光电技术研究所
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