Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography
文献类型：期刊论文
| 作者 | Liang, Gao-Feng1,2; Jiao, Jiao1; Luo, Xian-Gang2; Zhao, Qing1 |
| 刊名 | Chinese Physics B
 |
| 出版日期 | 2017 |
| 卷号 | 26期号:1页码:016801 |
| 关键词 | Atomic force microscopy - Deposition - Lithography - Photolithography - Plasmons - Substrates - Surface roughness |
| ISSN号 | 1674-1056 |
| 英文摘要 | The silver (Ag)/photoresist (PR)/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices. © 2017 Chinese Physical Society and IOP Publishing Ltd. |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/8795]  |
| 专题 | 光电技术研究所_微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu; 610054, China; 2.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China |
| 推荐引用方式 GB/T 7714 | Liang, Gao-Feng,Jiao, Jiao,Luo, Xian-Gang,et al. Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography[J]. Chinese Physics B,2017,26(1):016801. |
| APA | Liang, Gao-Feng,Jiao, Jiao,Luo, Xian-Gang,&Zhao, Qing.(2017).Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography.Chinese Physics B,26(1),016801. |
| MLA | Liang, Gao-Feng,et al."Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography".Chinese Physics B 26.1(2017):016801. |
入库方式： OAI收割
来源：光电技术研究所
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