光刻机光瞳整形系统设计与仿真研究
文献类型：学位论文
| 作者 | 马健 |
| 文献子类 | 硕士 |
| 导师 | 杨宝喜 |
| 关键词 | 光刻机 lithography machine 光瞳整形 pupil shaping 变焦系统 zoom system 轴锥镜组 axicon group 光学设计 optical design |
| 其他题名 | research on design and simulation of pupil shaping system for lithography |
| 英文摘要 | 摩尔定律和集成电路的发展一直推动着电子信息行业的技术进步，改变着社会的方方面面。维持摩尔定律的发展需要不断改进光学光刻技术来减小晶体管尺寸，而光刻机是光学光刻的核心设备。为了提高我国的集成电路和芯片发展水平，必须掌握高端光刻机的核心技术。在过去的几十年通过缩短光刻机曝光波长、运用分辨率增强技术，集成电路的发展一直遵循着摩尔定律，其中离轴照明就是一种常用的分辨率增强技术。离轴照明是通过光刻机照明系统中光瞳整形系统来实现。本论文主要针对光刻机光瞳整形系统的光学设计与相关仿真展开研究。 光刻机光瞳整形系统包括衍射光学元件、变焦准直系统和轴锥镜组。本文完成了对光刻机光瞳整形系统中变焦准直系统和轴锥镜组的光学设计，实现了各种照明模式下相干因子的连续可调。首先，根据光刻机照明系统中光瞳整形系统对各种照明模式的要求以及部分相干因子的调节范围确定了变焦准直系统的焦距变化范围，以及轴锥镜组的移动距离。其次，根据变焦系统的设计原理，设计出四组元变焦准直光学系统，同时根据轴锥镜的光束变换原理设计了平凹锥形镜和平凸锥形镜。 为了验证所设计的变焦准直光学系统以及轴锥镜组的性能，对变焦系统进行了仿真，对短焦、中焦和长焦位置的光瞳图案进行了分析。根据装配过程中衍射光学元件可能出现的偏心和倾斜，利用lighttools软件对光瞳整形系统进行了仿真，分析了偏心和倾斜对光瞳分布的影响以及光瞳特性参数的变化。; The development of Moore's Law and integrated circuits have been driving technological advances in the electronic information industry and thus changing all aspects of the society. Maintaining the development of Moore's Law requires the continuous improvement of optical lithography to reduce the size of transistors, and the lithography machine is the core device of optical lithography In order to improve the development level of integrated circuits and chips in China, we must master the core technologies of high-performance lithography machines. In the past few decades, the development of integrated circuits has followed Moore's Law by shortening the exposure wavelength of the lithography machine and using the resolution enhancement technology. Off-axis illumination is a common resolution enhancement technology. Off-axis illumination can be achieved by a pupil shaping system in the lithography machine illumination system. This thesis focuses on the optical design and related simulations of the pupil shaping system in the lithography machine. The lithography pupil shaping system includes a diffractive optical element, a zoom collimation system, and an axicon group. In this thesis, the optical design of the zoom collimation system and the axicon group in the pupil shaping system of the lithography machine is designed, and the continuous adjustment of the coherence factor under various illumination modes is realized. First of all, the focal length range of the zoom collimation system is determined according to the requirements of the pupil shaping system in the illumination system of the lithography machine for various illumination modes and the adjustment range of the partial coherence factor.The moving distance of axicon group is also determined by the partial coherence factor under various illumination modes. Then according to the design principle of the zoom system, a zooming collimation system is designed using a mechanical compensation four-component classic zoom structure. At the same time, a plano-concave axicon and a plano-convex axicon are designed according to the beam splitting principle of the axicon. In order to verify the performance of the designed zoom collimation optical system and the axicon group, the zoom system is simulated,and the pupil patterns in short,medium and long position is analyzed. According to the possible eccentricity and tilt of the diffractive optical element in the assembly process, the pupil shaping system is simulated using lighttools software. The effects of eccentricity and tilt on pupil distribution and changes in parameters of pupil characteristics are analyzed. |
| 学科主题 | 光学工程 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/31118]  |
| 专题 | 中国科学院上海光学精密机械研究所 |
| 作者单位 | 中国科学院上海光学精密机械研究所 |
| 推荐引用方式 GB/T 7714 | 马健. 光刻机光瞳整形系统设计与仿真研究[D]. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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