Modeling and optimization of lens heating effect for lithographic projector
文献类型：期刊论文
| 作者 | Mao, Yanjie1; Li, Sikun1; Sun, Gang2; Duan, Lifeng2; Bu, Yang1; Wang, Xiangzhao1 |
| 刊名 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
 |
| 卷号 | 17期号:2 |
| ISSN号 | 1932-5150 |
| 文献子类 | 期刊论文 ; Article |
| WOS记录号 | WOS:23501 |
| 出版者 | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS |
| 资助机构 | Natural Science Foundation of Shanghai [17ZR1434100] ; Natural Science Foundation of Shanghai [17ZR1434100] |
| 源URL | [http://ir.siom.ac.cn/handle/181231/30894]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai, Peoples R China 2.Univ Chinese Acad Sci, Beijing, Peoples R China 3.Shanghai Micro Elect Equipment Grp Co Ltd, Shanghai, Peoples R China |
| 推荐引用方式 GB/T 7714 | Mao, Yanjie,Li, Sikun,Sun, Gang,et al. Modeling and optimization of lens heating effect for lithographic projector[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,17(2). |
| APA | Mao, Yanjie,Li, Sikun,Sun, Gang,Duan, Lifeng,Bu, Yang,&Wang, Xiangzhao. |
| MLA | Mao, Yanjie,et al."Modeling and optimization of lens heating effect for lithographic projector".JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 17.2 |
入库方式： OAI收割
来源：上海光学精密机械研究所
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