中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Towards gamma-effect elimination in phase measurement profilometry

文献类型:期刊论文

作者Kamagara, Abel1; Wang, Xiangzhao1; Li, Sikun1
刊名OPTIK
卷号172页码:1089
ISSN号0030-4026
文献子类期刊论文 ; Article
出版者ELSEVIER GMBH, URBAN & FISCHER VERLAG
资助机构Chinese Academy of Sciences-The World Academy of Sciences (CAS-TWAS) President's Fellowship Initiative for international doctoral students; National Science and Technology Major Project of China [2017ZX02101006] ; Chinese Academy of Sciences-The World Academy of Sciences (CAS-TWAS) President's Fellowship Initiative for international doctoral students; National Science and Technology Major Project of China [2017ZX02101006]
源URL[http://ir.siom.ac.cn/handle/181231/30878]  
专题上海光学精密机械研究所_信息光学与光电技术实验室
作者单位1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100039, Peoples R China
推荐引用方式
GB/T 7714
Kamagara, Abel,Wang, Xiangzhao,Li, Sikun. Towards gamma-effect elimination in phase measurement profilometry[J]. OPTIK,172:1089.
APA Kamagara, Abel,Wang, Xiangzhao,&Li, Sikun.
MLA Kamagara, Abel,et al."Towards gamma-effect elimination in phase measurement profilometry".OPTIK 172

入库方式: OAI收割

来源:上海光学精密机械研究所

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