High thermal stability and intense 2.71 mu m emission in Er3+-doped fluorotellurite glass modified by GaF3
文献类型：期刊论文
| 作者 | Xue, Tianfeng1; Li, Yu1; Liu, Yinyao; Liu, Zijun2; Dai, Shixun2; Liao, Meisong; Hu, Lili |
| 刊名 | OPTICAL MATERIALS
 |
| 卷号 | 75页码:367 |
| ISSN号 | 0925-3467 |
| 文献子类 | 期刊论文 ; Article |
| 出版者 | ELSEVIER SCIENCE BV |
| 资助机构 | Chinese Academy of Sciences; National Natural Science Foundation of China [61475171, 61177083]; Pujiang Talent Plan [14PJ1409200]; Chinese Academy of Science [GJHZ1412]; Japan Society for the Promotion of Science [GJHZ1412] ; Chinese Academy of Sciences; National Natural Science Foundation of China [61475171, 61177083]; Pujiang Talent Plan [14PJ1409200]; Chinese Academy of Science [GJHZ1412]; Japan Society for the Promotion of Science [GJHZ1412] |
| 源URL | [http://ir.siom.ac.cn/handle/181231/30554]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab mat High Power Laser, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China 3.Ningbo Univ, Coll Informat Sci & Engn, Res Inst Adv Technol, Ningbo 315211, Zhejiang, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xue, Tianfeng,Li, Yu,Liu, Yinyao,et al. High thermal stability and intense 2.71 mu m emission in Er3+-doped fluorotellurite glass modified by GaF3[J]. OPTICAL MATERIALS,75:367. |
| APA | Xue, Tianfeng.,Li, Yu.,Liu, Yinyao.,Liu, Zijun.,Dai, Shixun.,...&Hu, Lili. |
| MLA | Xue, Tianfeng,et al."High thermal stability and intense 2.71 mu m emission in Er3+-doped fluorotellurite glass modified by GaF3".OPTICAL MATERIALS 75 |
入库方式： OAI收割
来源：上海光学精密机械研究所
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