Laser heat-mode lithography characteristics and mechanism of ZnS-SiO2 thin films
文献类型:期刊论文
作者 | Wei, Tao3; Wei, Jingsong; Zhang, Kui; Liu, Bo1,2; Bai, Zhen3; Wang, Yang; Cui, Yun; Wu, Yiqun; Zhang, Long4 |
刊名 | MATERIALS CHEMISTRY AND PHYSICS
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卷号 | 212页码:426 |
ISSN号 | 0254-0584 |
文献子类 | 期刊论文 ; Article |
出版者 | ELSEVIER SCIENCE SA |
资助机构 | National Natural Science Foundation of China [51672292, 61627826]; International Science & Technology Cooperation Program of China:intergovernmental international cooperation program in science and technology innovation [2016YFE0110600]; Chinese Academy of Sciences [XDB1603000] ; National Natural Science Foundation of China [51672292, 61627826]; International Science & Technology Cooperation Program of China:intergovernmental international cooperation program in science and technology innovation [2016YFE0110600]; Chinese Academy of Sciences [XDB1603000] |
源URL | [http://ir.siom.ac.cn/handle/181231/30525] ![]() |
专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct mat Informat, Shanghai 200050, Peoples R China 3.Suzhou Univ Sci & Technol, Sch Chem Biol & mat Engn, Suzhou 215009, Jiangsu, Peoples R China 4.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 5.Shanghai Jiao Tong Univ, CICIFSA, Shanghai 200240, Peoples R China |
推荐引用方式 GB/T 7714 | Wei, Tao,Wei, Jingsong,Zhang, Kui,et al. Laser heat-mode lithography characteristics and mechanism of ZnS-SiO2 thin films[J]. MATERIALS CHEMISTRY AND PHYSICS,212:426. |
APA | Wei, Tao.,Wei, Jingsong.,Zhang, Kui.,Liu, Bo.,Bai, Zhen.,...&Zhang, Long. |
MLA | Wei, Tao,et al."Laser heat-mode lithography characteristics and mechanism of ZnS-SiO2 thin films".MATERIALS CHEMISTRY AND PHYSICS 212 |
入库方式: OAI收割
来源:上海光学精密机械研究所
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