中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Thermochromism of vanadium dioxide films controlled by the thickness of ZnO buffer layer under low substrate temperature

文献类型:期刊论文

作者Zhu, Maodong1; Qi, Hongji; Wang, Bin; Wang, Hu; Guan, Tianrui2; Zhang, Dongping2
刊名JOURNAL OF ALLOYS AND COMPOUNDS
卷号740页码:844
ISSN号0925-8388
文献子类期刊论文 ; Article
出版者ELSEVIER SCIENCE SA
资助机构Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966]; National Natural Science Foundation of China [11535010] ; Shenzhen Basic Research Project [JCYJ20150529164656098, ZDSY20170228105421966]; National Natural Science Foundation of China [11535010]
源URL[http://ir.siom.ac.cn/handle/181231/30489]  
专题上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab mat High Power Laser, Shanghai 201800, Peoples R China
2.Univ Chinese Acad Sci, Beijing 1000492, Peoples R China
3.Shenzhen Univ, Coll Phys & Energy, Shenzhen Key Lab Adv Thin Film & Applicat, Shenzhen 518060, Peoples R China
推荐引用方式
GB/T 7714
Zhu, Maodong,Qi, Hongji,Wang, Bin,et al. Thermochromism of vanadium dioxide films controlled by the thickness of ZnO buffer layer under low substrate temperature[J]. JOURNAL OF ALLOYS AND COMPOUNDS,740:844.
APA Zhu, Maodong,Qi, Hongji,Wang, Bin,Wang, Hu,Guan, Tianrui,&Zhang, Dongping.
MLA Zhu, Maodong,et al."Thermochromism of vanadium dioxide films controlled by the thickness of ZnO buffer layer under low substrate temperature".JOURNAL OF ALLOYS AND COMPOUNDS 740

入库方式: OAI收割

来源:上海光学精密机械研究所

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