Electrochromic behavior of WO3 thin films prepared by GLAD
文献类型：期刊论文
| 作者 | Yuan, Jiali1,2; Wang, Bin; Wang, Hu; Chai, Yingjie; Jin, Yaxue1; Qi, Hongji; Shao, Jianda |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 卷号 | 447页码:471 |
| ISSN号 | 0169-4332 |
| 文献子类 | 期刊论文 ; Article |
| 出版者 | ELSEVIER SCIENCE BV |
| 资助机构 | CAS Interdisciplinary Innovation Team; National Natural Science Foundation of China [11535010] ; CAS Interdisciplinary Innovation Team; National Natural Science Foundation of China [11535010] |
| 源URL | [http://ir.siom.ac.cn/handle/181231/30469]  |
| 专题 | 上海光学精密机械研究所_中科院强激光材料重点实验室 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab mat High Power Laser, Shanghai 201800, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.ShanghaiTech Univ, Shanghai 201210, Peoples R China |
| 推荐引用方式 GB/T 7714 | Yuan, Jiali,Wang, Bin,Wang, Hu,et al. Electrochromic behavior of WO3 thin films prepared by GLAD[J]. APPLIED SURFACE SCIENCE,447:471. |
| APA | Yuan, Jiali.,Wang, Bin.,Wang, Hu.,Chai, Yingjie.,Jin, Yaxue.,...&Shao, Jianda. |
| MLA | Yuan, Jiali,et al."Electrochromic behavior of WO3 thin films prepared by GLAD".APPLIED SURFACE SCIENCE 447 |
入库方式： OAI收割
来源：上海光学精密机械研究所
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