中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser

文献类型:期刊论文

作者Du, Kun1; Jiang, Lan1; Li, Xiaowei1; Zhang, Hao1; Wang, Andong1; Yao, Zhulin1; Pan, Changji1; Wang, Zhi1; Li, Ming2; Grigoropoulos, Costas P.3
刊名Applied Surface Science
出版日期2019-03-01
卷号469页码:44-49
ISSN号01694332
DOI10.1016/j.apsusc.2018.10.272
产权排序2
英文摘要

We report the influence of temporally decreasing pulse trains on femtosecond laser-induced chemical etching (FLICE) of fused silica. A systematic comparison of the unshaped pulse and decreasing pulse trains of femtosecond laser for FLICE was conducted, and the differences were interpreted using a plasma model. The results revealed that the decreasing pulse trains not only affected the etching efficiency but also affected the morphology of the etched crater. When an etched crater was pre-irradiated by decreasing pulse trains, it presented a funnel-like shape at the early stage of the etching process, which contrasted with the one pre-irradiated by unshaped pulse. At the later stage of the etching process, the funnel-like shape gradually disappeared, and the crater increased in size. Compared with the unshaped pulse under the same processing conditions, the decreasing pulse trains enhanced the etched crater volume by approximately 18 times. Theoretical calculations based on the plasma model indicated that the free-electron density generated using the unshaped pulse was much higher than that generated by the decreasing pulse trains in skin layer of the sample during the first few hundred femtoseconds. The high free-electron density increased the reflectivity in skin layer of the sample; thus, the tail part of the incident pulse was strongly reflected. Consequently, the laser energy deposition into the fused silica sample decreased, eventually led to a low etching efficiency. © 2018

语种英语
出版者Elsevier B.V.
源URL[http://ir.opt.ac.cn/handle/181661/30713]  
专题西安光学精密机械研究所_瞬态光学技术国家重点实验室
通讯作者Jiang, Lan
作者单位1.Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing; 100081, China;
2.State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics of CAS, Xi'an; 710119, China;
3.Laser Thermal Laboratory, Department of Mechanical Engineering, University of California, 6129 Etcheverry Hall, Berkeley; CA; 94720-1740, United States;
4.Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln; NE; 68588-0511, United States
推荐引用方式
GB/T 7714
Du, Kun,Jiang, Lan,Li, Xiaowei,et al. Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser[J]. Applied Surface Science,2019,469:44-49.
APA Du, Kun.,Jiang, Lan.,Li, Xiaowei.,Zhang, Hao.,Wang, Andong.,...&Lu, Yongfeng.(2019).Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser.Applied Surface Science,469,44-49.
MLA Du, Kun,et al."Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser".Applied Surface Science 469(2019):44-49.

入库方式: OAI收割

来源:西安光学精密机械研究所

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