中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Growth of low-threading-dislocation-density GaN on graphene by hydride vapor phase epitaxy

文献类型:期刊论文

作者He, Shunyu; Xu, Yu; Qi, Lin; Li, Zongyao; Cao, Bing; Wang, Chinhua; Zhang, Jicai(张纪才); Wang, Jianfeng(王建峰); Xu, Ke(徐科)
刊名JAPANESE JOURNAL OF APPLIED PHYSICS
出版日期2017
语种英语
源URL[http://ir.sinano.ac.cn/handle/332007/5426]  
专题苏州纳米技术与纳米仿生研究所_测试分析平台
推荐引用方式
GB/T 7714
He, Shunyu,Xu, Yu,Qi, Lin,et al. Growth of low-threading-dislocation-density GaN on graphene by hydride vapor phase epitaxy[J]. JAPANESE JOURNAL OF APPLIED PHYSICS,2017.
APA He, Shunyu.,Xu, Yu.,Qi, Lin.,Li, Zongyao.,Cao, Bing.,...&Xu, Ke.(2017).Growth of low-threading-dislocation-density GaN on graphene by hydride vapor phase epitaxy.JAPANESE JOURNAL OF APPLIED PHYSICS.
MLA He, Shunyu,et al."Growth of low-threading-dislocation-density GaN on graphene by hydride vapor phase epitaxy".JAPANESE JOURNAL OF APPLIED PHYSICS (2017).

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。