Growth Model of van der Waals Epitaxy of Films: A Case of AlN Films on Multilayer Graphene/SiC
文献类型:期刊论文
作者 | Xu, Yu(徐俞); Cao, Bing; Li, Zongyao; Cai, Demin; Zhang, Yumin; Ren, Guoqiang; Wang, Jianfeng(王建峰); Shi, Lin(石林); Wang, Chinhua; Xu, Ke(徐科) |
刊名 | ACS Applied Materials and Interfaces
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出版日期 | 2017 |
语种 | 英语 |
源URL | [http://ir.sinano.ac.cn/handle/332007/5425] ![]() |
专题 | 苏州纳米技术与纳米仿生研究所_测试分析平台 |
通讯作者 | Xu K(徐科) |
推荐引用方式 GB/T 7714 | Xu, Yu,Cao, Bing,Li, Zongyao,et al. Growth Model of van der Waals Epitaxy of Films: A Case of AlN Films on Multilayer Graphene/SiC[J]. ACS Applied Materials and Interfaces,2017. |
APA | Xu, Yu.,Cao, Bing.,Li, Zongyao.,Cai, Demin.,Zhang, Yumin.,...&徐科.(2017).Growth Model of van der Waals Epitaxy of Films: A Case of AlN Films on Multilayer Graphene/SiC.ACS Applied Materials and Interfaces. |
MLA | Xu, Yu,et al."Growth Model of van der Waals Epitaxy of Films: A Case of AlN Films on Multilayer Graphene/SiC".ACS Applied Materials and Interfaces (2017). |
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