中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Improved metal assisted chemical etching method for uniform, vertical and deep silicon structure

文献类型:期刊论文

作者Miao, Bin; Zhang, Jian; Ding(张鉴), Xiangzhen; Wu, Dongmin; Wu, Yihui; Lu, Wenhui; Li, Jiadong
刊名JOURNAL OF MICROMECHANICS AND MICROENGINEERING
出版日期2017
语种英语
源URL[http://ir.sinano.ac.cn/handle/332007/5464]  
专题苏州纳米技术与纳米仿生研究所_大科学装置
推荐引用方式
GB/T 7714
Miao, Bin,Zhang, Jian,Ding,et al. Improved metal assisted chemical etching method for uniform, vertical and deep silicon structure[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING,2017.
APA Miao, Bin.,Zhang, Jian.,Ding.,Wu, Dongmin.,Wu, Yihui.,...&Li, Jiadong.(2017).Improved metal assisted chemical etching method for uniform, vertical and deep silicon structure.JOURNAL OF MICROMECHANICS AND MICROENGINEERING.
MLA Miao, Bin,et al."Improved metal assisted chemical etching method for uniform, vertical and deep silicon structure".JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2017).

入库方式: OAI收割

来源:苏州纳米技术与纳米仿生研究所

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