Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching
文献类型：期刊论文
| 作者 | Zhao, Yanfei; Hu Wang; Wei Zhang; Li, Jiadong; Yang Shen; Huang, Zengli（黄增立）; Jian Zhang（张鉴）; An Dingsun（丁孙安）; Zhang J(张鉴); Ding SA(丁孙安) |
| 刊名 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING
 |
| 出版日期 | 2017 |
| 语种 | 英语 |
| 源URL | [http://ir.sinano.ac.cn/handle/332007/5334]  |
| 专题 | 苏州纳米技术与纳米仿生研究所_大科学装置 |
| 通讯作者 | Zhang J(张鉴); Ding SA(丁孙安) |
| 推荐引用方式 GB/T 7714 | Zhao, Yanfei,Hu Wang,Wei Zhang,et al. Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING,2017. |
| APA | Zhao, Yanfei.,Hu Wang.,Wei Zhang.,Li, Jiadong.,Yang Shen.,...&丁孙安.(2017).Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. |
| MLA | Zhao, Yanfei,et al."Controllable process of nanostructured GaN by maskless inductively coupled plasma (ICP) etching".JOURNAL OF MICROMECHANICS AND MICROENGINEERING (2017). |
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