Discharge state transition and cathode fall thickness evolution during chromium HiPIMS discharge
文献类型：期刊论文
| 作者 | Zuo, Xiao; Ke, Peiling; Chen, Rende; Li, Xiaowei; Oden, Magnus; Wang, Aiying |
| 刊名 | PHYSICS OF PLASMAS
 |
| 出版日期 | 2017 |
| 卷号 | 24期号:8页码:83507 |
| ISSN号 | 1070-664X |
| 英文摘要 | The temporal evolutions of target voltage and current waveforms under different pulse voltage and working pressure conditions were studied during Cr high power impulse magnetron sputtering discharges. Target voltage and current characteristics demonstrated that when the pulse width was set as 200 mu s, HiPIMS discharge went through a four-stage sequence during each pulse, Townsend discharge, glow discharge, afterglow, and pulse-off stages. A discharge state transition in the glow discharge stage happened at high pulse voltage and working pressure conditions. Furthermore, the dependence of reduced cathode fall thickness pdcon pulse voltage, working pressure, and normalized current density j/p(2) was presented. It was found that gas rarefaction leads to a change of relationship between pd(c) and j/p(2). A noticeable increase of the cathode fall thickness caused by gas rarefaction has been found. Published by AIP Publishing. |
| 公开日期 | 2017-12-25 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/13708]  |
| 专题 | 2017专题 |
| 推荐引用方式 GB/T 7714 | Zuo, Xiao,Ke, Peiling,Chen, Rende,et al. Discharge state transition and cathode fall thickness evolution during chromium HiPIMS discharge[J]. PHYSICS OF PLASMAS,2017,24(8):83507. |
| APA | Zuo, Xiao,Ke, Peiling,Chen, Rende,Li, Xiaowei,Oden, Magnus,&Wang, Aiying.(2017).Discharge state transition and cathode fall thickness evolution during chromium HiPIMS discharge.PHYSICS OF PLASMAS,24(8),83507. |
| MLA | Zuo, Xiao,et al."Discharge state transition and cathode fall thickness evolution during chromium HiPIMS discharge".PHYSICS OF PLASMAS 24.8(2017):83507. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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