Micro/Nanotexture Design for Improving Tribological Properties of Cr/GLC Films in Seawater
文献类型:期刊论文
作者 | Ye, Yuwei; Wang, Chunting; Chen, Hao; Wang, Yongxin; Zhao, Wenjie; Mu, Yongtao |
刊名 | TRIBOLOGY TRANSACTIONS
![]() |
出版日期 | 2017 |
卷号 | 60期号:1页码:95-105 |
ISSN号 | 1040-2004 |
英文摘要 | Microdimples with different diameters and Cr/graphite-like carbon (GLC) films were fabricated on silicon by laser surface texturing and magnetron sputtering technology, respectively. The texturing effects on the microstructures and tribological performance in seawater were comparatively investigated. The results showed that both the friction coefficients and wear rates in seawater decreased with an increase in dimple diameter in the lower range and then increased with a further increase in diameter. The Cr/GLC film with an appropriate diameter of dimples (1.5 mm) is effective in enhancing the tribological properties due to entrapment of wear particles and seawater in the dimples. In addition, the roughness and graphitization contact area have obvious effects on the wear resistance. If the surface roughness is too high, the graphitization contact area will decrease, and the ratio of minimum aqueous film thickness to the surface roughness is so small that the load is almost totally borne by the boundary film. |
公开日期 | 2017-12-25 |
源URL | [http://ir.nimte.ac.cn/handle/174433/14100] ![]() |
专题 | 2017专题 |
推荐引用方式 GB/T 7714 | Ye, Yuwei,Wang, Chunting,Chen, Hao,et al. Micro/Nanotexture Design for Improving Tribological Properties of Cr/GLC Films in Seawater[J]. TRIBOLOGY TRANSACTIONS,2017,60(1):95-105. |
APA | Ye, Yuwei,Wang, Chunting,Chen, Hao,Wang, Yongxin,Zhao, Wenjie,&Mu, Yongtao.(2017).Micro/Nanotexture Design for Improving Tribological Properties of Cr/GLC Films in Seawater.TRIBOLOGY TRANSACTIONS,60(1),95-105. |
MLA | Ye, Yuwei,et al."Micro/Nanotexture Design for Improving Tribological Properties of Cr/GLC Films in Seawater".TRIBOLOGY TRANSACTIONS 60.1(2017):95-105. |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。