Effect of oxygen flux on stress and optical properties of Ta2O5 using Ion-beam sputtering
文献类型：会议论文
| 作者 | Yu, Qi1,2,3; Fan, Jun-Qi1,2; Guan, Chun-Lin1,2 |
| 出版日期 | 2017 |
| 关键词 | Compressive stress - Ion beams - Ions - Optical properties - Oxygen - Refractive index - Sputtering - Stresses - Tantalum oxides - Thin films |
| 卷号 | 10255 |
| 页码 | 102551E |
| 英文摘要 | The ion-beam sputtering deposition is a good technique for making low scattering coatings. In this work, the Ta2O5thin films as the oxygen flux (15-35sccm) were prepared on the K9 glass using the single ion-beam sputtering. As the oxygen flux increased, the thickness of films with the same deposited time decreased from 936.67nm to 837.87nm. The refractive index was 2.075 in 1000nm at 30 sccm. The stress increased along with the increasing of oxygen flux. In the work, the compressive stress increased from 319.55 Mpa to 410.92 Mpa. © 2017 SPIE. |
| 会议录 | 0277-786X
 |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9039]  |
| 专题 | 光电技术研究所_自适应光学技术研究室（八室） |
| 作者单位 | 1.Key Laboratory of Adaptive Optics, Chinese Academy of Science, Chengdu Sichuan; 610209, China; 2.Institute of Optics and Electronics, Chinese Academy of Science, Chengdu Sichuan; 610209, China; 3.University of Chinese Academy of Science, Beijing; 100049, China |
| 推荐引用方式 GB/T 7714 | Yu, Qi,Fan, Jun-Qi,Guan, Chun-Lin. Effect of oxygen flux on stress and optical properties of Ta2O5 using Ion-beam sputtering[C]. 见:. |
入库方式： OAI收割
来源：光电技术研究所
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