Etching hard brittle optical materials by masked ion beam
文献类型：会议论文
| 作者 | Li, Yun; Fu, Taotao; Jia, Xin; Xing, Tingwen |
| 出版日期 | 2017 |
| 关键词 | Brittleness - Ions - Masks - Surface roughness |
| 卷号 | 10448 |
| 页码 | 1044809 |
| 英文摘要 | The fabrication of small size aspheric optical surface, which made of hard brittle materials, usually uses optical cold processing. However, it is difficult to achieve the ideal requirements of the surface accuracy and roughness. In order to solve this problem, the masked ion beam figuring method is used to etch the one-dimension structure on the plat surface which made of hard brittle material. The results show that the expected surface profile is acquired and meanwhile mainly kept the original roughness and mid-frequency. It provides a possible way for fabricating small size aspheric optics which made of hard brittle materials. Copyright © 2017 SPIE. |
| 会议录 | 0277-786X
 |
| 语种 | 英语 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/9033]  |
| 专题 | 超精密总体部 |
| 作者单位 | Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China |
| 推荐引用方式 GB/T 7714 | Li, Yun,Fu, Taotao,Jia, Xin,et al. Etching hard brittle optical materials by masked ion beam[C]. 见:. |
入库方式： OAI收割
来源：光电技术研究所
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