中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Raman study of gap mode and lattice disorder effect in InN films prepared by plasma-assisted molecular beam epitaxy

文献类型:期刊论文

作者J.B.Wang; Z.F.Li; P.P.Chen; WeiLu; T.Yao
刊名Acta Materialia
出版日期2007
卷号1期号:55
WOS记录号WOS:000242928700016
公开日期2011-10-11
源URL[http://202.127.1.142/handle/181331/2394]  
专题上海技术物理研究所_上海技物所
推荐引用方式
GB/T 7714
J.B.Wang,Z.F.Li,P.P.Chen,et al. Raman study of gap mode and lattice disorder effect in InN films prepared by plasma-assisted molecular beam epitaxy[J]. Acta Materialia,2007,1(55).
APA J.B.Wang,Z.F.Li,P.P.Chen,WeiLu,&T.Yao.(2007).Raman study of gap mode and lattice disorder effect in InN films prepared by plasma-assisted molecular beam epitaxy.Acta Materialia,1(55).
MLA J.B.Wang,et al."Raman study of gap mode and lattice disorder effect in InN films prepared by plasma-assisted molecular beam epitaxy".Acta Materialia 1.55(2007).

入库方式: OAI收割

来源:上海技术物理研究所

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