Cytocompatible tantalum films on Ti6Al4V substrate by filtered cathodic vacuum arc deposition
文献类型：期刊论文
| 作者 | Hee, Ay Ching; Cao, Huiliang1; Zhao, Yue2; Jamali, Sina S.; Bendavid, Avi; Martin, Philip J. |
| 刊名 | BIOELECTROCHEMISTRY
 |
| 出版日期 | 2018 |
| 卷号 | 122页码:32 |
| 关键词 | Tantalum films Filtered cathodic vacuum arc deposition Cytocompatibility Electrochemical impedance spectroscopy |
| ISSN号 | 1567-5394 |
| DOI | 10.1016/j.bioelechem.2018.02.006 |
| 英文摘要 | Tantalum films were deposited on negatively biased Ti6Al4V substrates using filtered cathodic vacuum arc deposition to enhance the corrosion resistance of the Ti6Al4V alloy. The effect of substrate voltage bias on the microstructure, mechanical and corrosion properties was examined and the cytocompatibility of the deposited films was verified with mammalian cell culturing. The Ta films deposited with substrate bias of -100 V and -200 V show a mixture of predominantly beta phase and minority of a phase. The Ta/-100 V film shows adhesive failure at the Ti/fa interface and a cohesive fracture is observed in Ta/-200 V film. The Ta/-100 V showed a significant improvement in corrosion resistance, which is attributed to the stable oxide layer. The in-vitro cytocompatibility of the materials was investigated using rat bone mesenchymal stem cells, and the results show that the Ta films have no adverse effect on mammalian cell adhesion and spreading proliferation. (C) 2018 Elsevier B.V. All rights reserved. |
| 学科主题 | Biochemistry & Molecular Biology ; Biology ; Biophysics ; Electrochemistry |
| WOS记录号 | WOS:000436649600004 |
| 出版者 | ELSEVIER SCIENCE SA |
| 资助机构 | This work was financially supported by the University Postgraduate Award, University of Wollongong. The authors acknowledge use of facilities within the UOW Electron Microscopy Centre and the help of Thomas Jurak in the final language editing of this paper. H. Cao would like to acknowledge the National Natural Science Foundation of China (31670980), the Shanghai Rising-Star Program (15QA1404100) and the Youth Innovation Promotion Association CAS (2015204). ; This work was financially supported by the University Postgraduate Award, University of Wollongong. The authors acknowledge use of facilities within the UOW Electron Microscopy Centre and the help of Thomas Jurak in the final language editing of this paper. H. Cao would like to acknowledge the National Natural Science Foundation of China (31670980), the Shanghai Rising-Star Program (15QA1404100) and the Youth Innovation Promotion Association CAS (2015204). |
| 源URL | [http://ir.sic.ac.cn/handle/331005/24780]  |
| 专题 | 中国科学院上海硅酸盐研究所 |
| 作者单位 | 1.[Hee, Ay Ching; Zhao, Yue; Jamali, Sina S.] Univ Wollongong, Sch Mech Mat Mechatron & Biomed Engn, Wollongong, NSW 2522, Australia 2.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China 3.Tianjin Univ Technol, Sch Mat Sci & Engn, Tianjin 300384, Peoples R China 4.Bendavid, Avi; Martin, Philip J.] CSIRO, Mfg Business Unit, POB 218, Lindfield, NSW 2070, Australia |
| 推荐引用方式 GB/T 7714 | Hee, Ay Ching,Cao, Huiliang,Zhao, Yue,et al. Cytocompatible tantalum films on Ti6Al4V substrate by filtered cathodic vacuum arc deposition[J]. BIOELECTROCHEMISTRY,2018,122:32, 39. |
| APA | Hee, Ay Ching,Cao, Huiliang,Zhao, Yue,Jamali, Sina S.,Bendavid, Avi,&Martin, Philip J..(2018).Cytocompatible tantalum films on Ti6Al4V substrate by filtered cathodic vacuum arc deposition.BIOELECTROCHEMISTRY,122,32. |
| MLA | Hee, Ay Ching,et al."Cytocompatible tantalum films on Ti6Al4V substrate by filtered cathodic vacuum arc deposition".BIOELECTROCHEMISTRY 122(2018):32. |
入库方式： OAI收割
来源：上海硅酸盐研究所
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