Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating
文献类型:期刊论文
作者 | Li, Shipu1; Zhang, Peng1; Xie, Xiaofeng2; Song, Xuefeng1; Liu, Jing1; Zhao, Liping1; Chen, Han1; Gao, Lian1 |
刊名 | Applied Catalysis B: Environmental
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出版日期 | 2017 |
卷号 | 200页码:372-377 |
ISSN号 | 09263373 |
DOI | 10.1016/j.apcatb.2016.07.031 |
源URL | [http://ir.sic.ac.cn/handle/331005/25988] ![]() |
专题 | 中国科学院上海硅酸盐研究所 |
作者单位 | 1.State Key Lab of Metal Matrix Composites, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai; 200240, China; 2.State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai; 200050, China |
推荐引用方式 GB/T 7714 | Li, Shipu,Zhang, Peng,Xie, Xiaofeng,et al. Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating[J]. Applied Catalysis B: Environmental,2017,200:372-377. |
APA | Li, Shipu.,Zhang, Peng.,Xie, Xiaofeng.,Song, Xuefeng.,Liu, Jing.,...&Gao, Lian.(2017).Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating.Applied Catalysis B: Environmental,200,372-377. |
MLA | Li, Shipu,et al."Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating".Applied Catalysis B: Environmental 200(2017):372-377. |
入库方式: OAI收割
来源:上海硅酸盐研究所
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