中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating

文献类型:期刊论文

作者Li, Shipu1; Zhang, Peng1; Xie, Xiaofeng2; Song, Xuefeng1; Liu, Jing1; Zhao, Liping1; Chen, Han1; Gao, Lian1
刊名Applied Catalysis B: Environmental
出版日期2017
卷号200页码:372-377
ISSN号09263373
DOI10.1016/j.apcatb.2016.07.031
源URL[http://ir.sic.ac.cn/handle/331005/25988]  
专题中国科学院上海硅酸盐研究所
作者单位1.State Key Lab of Metal Matrix Composites, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai; 200240, China;
2.State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai; 200050, China
推荐引用方式
GB/T 7714
Li, Shipu,Zhang, Peng,Xie, Xiaofeng,et al. Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating[J]. Applied Catalysis B: Environmental,2017,200:372-377.
APA Li, Shipu.,Zhang, Peng.,Xie, Xiaofeng.,Song, Xuefeng.,Liu, Jing.,...&Gao, Lian.(2017).Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating.Applied Catalysis B: Environmental,200,372-377.
MLA Li, Shipu,et al."Enhanced photoelectrochemical performance of planar p-Silicon by APCVD deposition of surface mesoporous hematite coating".Applied Catalysis B: Environmental 200(2017):372-377.

入库方式: OAI收割

来源:上海硅酸盐研究所

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