Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films
文献类型：期刊论文
| 作者 | Esposito, V.1; Ni, D.W.2; Sanna, S.1; Gualandris, F.1; Pryds, N.1 |
| 刊名 | RSC Advances
 |
| 出版日期 | 2017 |
| 卷号 | 7期号:23页码:13784-13788 |
| DOI | 10.1039/c7ra01226h |
| 英文摘要 | Acceptor-doped nanocrystalline cerium oxide thin films are mechanically constrained nano-domains, with film/substrate interfacial strain and chemical doping deadlock mass diffusion. In contrast, in this paper we show that chemical elements result in highly unstable thin films under chemical reduction, with unexpected diffusion-driven effects such as fast migration of grain boundaries, porosity nucleation, and interdiffusion at low temperatures. © The Royal Society of Chemistry. |
| 源URL | [http://ir.sic.ac.cn/handle/331005/25860]  |
| 专题 | 中国科学院上海硅酸盐研究所 |
| 作者单位 | 1.Technical University of Denmark, Department of Energy Conversion and Storage, Frederiksborgvej 399, 4000, Denmark; 2.Shanghai Institute of Ceramics, Chinese Academy of Sciences, Heshuo Road 588#, Jiading District, Shanghai, China |
| 推荐引用方式 GB/T 7714 | Esposito, V.,Ni, D.W.,Sanna, S.,et al. Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films[J]. RSC Advances,2017,7(23):13784-13788. |
| APA | Esposito, V.,Ni, D.W.,Sanna, S.,Gualandris, F.,&Pryds, N..(2017).Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films.RSC Advances,7(23),13784-13788. |
| MLA | Esposito, V.,et al."Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films".RSC Advances 7.23(2017):13784-13788. |
入库方式： OAI收割
来源：上海硅酸盐研究所
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