Resolution deterioration in emission electron microscopy due to object roughness
文献类型：期刊论文
| 作者 | Nepijko, SA; Sedov, NN; Schonhense, G; Escher, M; Bao, XH; Huang, WX |
| 刊名 | annalen der physik
 |
| 出版日期 | 2000 |
| 卷号 | 9期号:6页码:441-451 |
| 关键词 | emission electron microscope (EEM) resolution object roughness computer simulation |
| 英文摘要 | in the present paper a general analytic expression has been obtained and confirmed by a computer simulation which links the surface roughness of an object under study in an emission electron microscope and it's resolution. a quantitative derivation was made for the model case when there is a step on the object surface. it was shown that the resolution is deteriorated asymmetrically relative to the step. the effect sets a practical limit to the ultimate lateral resolution obtainable in an emission electron microscope. |
| WOS标题词 | science & technology ; physical sciences |
| 类目[WOS] | physics, multidisciplinary |
| 研究领域[WOS] | physics |
| 关键词[WOS] | peem |
| 收录类别 | SCI |
| 原文出处 | true |
| 语种 | 英语 |
| WOS记录号 | WOS:000088049100002 |
| 公开日期 | 2010-11-30 |
| 源URL | [http://159.226.238.44/handle/321008/85051]  |
| 专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
| 作者单位 | 1.Natl Acad Sci Ukraine, Inst Phys, UA-03650 Kiev, Ukraine 2.Moscow Mil Inst, Moscow 109380, Russia 3.Univ Mainz, Inst Phys, D-55099 Mainz, Germany 4.Focus GmbH, D-65510 Hunstetten Gorsroth, Germany 5.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian 116023, Peoples R China |
| 推荐引用方式 GB/T 7714 | Nepijko, SA,Sedov, NN,Schonhense, G,et al. Resolution deterioration in emission electron microscopy due to object roughness[J]. annalen der physik,2000,9(6):441-451. |
| APA | Nepijko, SA,Sedov, NN,Schonhense, G,Escher, M,Bao, XH,&Huang, WX.(2000).Resolution deterioration in emission electron microscopy due to object roughness.annalen der physik,9(6),441-451. |
| MLA | Nepijko, SA,et al."Resolution deterioration in emission electron microscopy due to object roughness".annalen der physik 9.6(2000):441-451. |
入库方式： OAI收割
来源：大连化学物理研究所
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