VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter
文献类型:期刊论文
作者 | Huang SL ; Wu Y ; Zhu XF ; Li LX ; Wang ZG ; Wang LZ ; Lu GQ |
刊名 | journal of applied physics |
出版日期 | 2011 |
卷号 | 109期号:8页码:article no.84328 |
ISSN号 | 0021-8979 |
关键词 | SILICON NANOWIRES SURFACE MIGRATION NANOSTRUCTURES CATALYST |
通讯作者 | zhu, xf, xiamen univ, china. australia joint lab funct nanomat, xiamen 361005, peoples r china. zhux@xmu.edu.cn |
学科主题 | 半导体材料 |
资助信息 | china-most [2008dfa51230]; national key basic science research program (973 project) [2007cb936603]; nsfc [60776007, 11074207]; china ministry of education [20100121110023]; srf for rocs, sem |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2011-07-05 ; 2011-07-15 |
附注 | with a precise control of temperature, gas flow, and pressure and with sequentially increased durations for reactions, the detailed processes of catalyzing, nucleation, and growth of the siox nanowires were successfully traced. especially a stepwise nonuniformity in diameter of nanowire during the growth was for the first time detected. with analysis of these detailed processes via nanocurvature and nano ripening effects, a further understanding of the vapor-liquid-solid mechanism was achieved and a novel mechanism for formation of the stepwise nonuniformity in diameter of nanowire was particularly proposed. all these will be the crucial basis for the further, accurately controlled growth of siox nanowires and the relevant applications. (c) 2011 american institute of physics. [doi:10.1063/1.3574398] |
源URL | [http://ir.semi.ac.cn/handle/172111/21243] |
专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
推荐引用方式 GB/T 7714 | Huang SL,Wu Y,Zhu XF,et al. VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter[J]. journal of applied physics,2011,109(8):article no.84328. |
APA | Huang SL.,Wu Y.,Zhu XF.,Li LX.,Wang ZG.,...&Lu GQ.(2011).VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter.journal of applied physics,109(8),article no.84328. |
MLA | Huang SL,et al."VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter".journal of applied physics 109.8(2011):article no.84328. |
入库方式: OAI收割
来源:半导体研究所
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