中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Temperature Compensation for Threshold Current and Slope Efficiency of 1.3 mu m InAs/GaAs Quantum-Dot Lasers by Facet Coating Design

文献类型:期刊论文

作者Cao YL; Yang T
刊名chinese physics letters
出版日期2011
卷号28期号:4页码:article no.44201
ISSN号0256-307x
关键词WELL LASERS DEPENDENCE DIODE GAIN
通讯作者xu, pf, chinese acad sci, inst semicond, key lab semicond mat sci, beijing 100083, peoples r china. tyang@semi.ac.cn
学科主题半导体材料
资助信息chinese academy of sciences ; national natural science foundation of china [60876033, 61076050, 61021003]
收录类别SCI
语种英语
公开日期2011-07-05 ; 2011-07-15
附注we demonstrate a technique of temperature compensation for 1.3 mu m inas/gaas quantum-dot (qd) lasers by facet coating design. the key point of the technique is to make sure that the mirror loss of the lasers decreases as the temperature rises. to realize this, we design a type of facet coating by shifting the central wavelength of the facet coating from 1310nm to 1480 nm, whose reflectivity increases as the emission wavelength of the lasers red-shifts. consequently, the laser with the new facet coating exhibits a characteristic temperature doubled in size and a more stable slope efficiency in the temperature range from 10 degrees c to 70 degrees c, compared with the traditional one with a temperature-independent mirror loss.
源URL[http://ir.semi.ac.cn/handle/172111/21267]  
专题半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式
GB/T 7714
Cao YL,Yang T. Temperature Compensation for Threshold Current and Slope Efficiency of 1.3 mu m InAs/GaAs Quantum-Dot Lasers by Facet Coating Design[J]. chinese physics letters,2011,28(4):article no.44201.
APA Cao YL,&Yang T.(2011).Temperature Compensation for Threshold Current and Slope Efficiency of 1.3 mu m InAs/GaAs Quantum-Dot Lasers by Facet Coating Design.chinese physics letters,28(4),article no.44201.
MLA Cao YL,et al."Temperature Compensation for Threshold Current and Slope Efficiency of 1.3 mu m InAs/GaAs Quantum-Dot Lasers by Facet Coating Design".chinese physics letters 28.4(2011):article no.44201.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。