中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors

文献类型:期刊论文

作者Lv YJ ; Lin ZJ ; Zhang Y ; Meng LG ; Luan CB ; Cao ZF ; Chen H ; Wang ZG
刊名applied physics letters
出版日期2011
卷号98期号:12页码:article no.123512
关键词2-DIMENSIONAL ELECTRON-GAS INTERFACIAL LAYER MOBILITY
ISSN号0003-6951
通讯作者lin, zj, shandong univ, sch phys, jinan 250100, peoples r china. linzj@sdu.edu.cn
学科主题半导体材料
收录类别SCI
资助信息national natural science foundation of china [10774090]; national basic research program of china [2007cb936602]
语种英语
公开日期2011-07-05 ; 2011-07-15
附注using the measured capacitance-voltage curves of ni schottky contacts with different contact areas and the current-voltage characteristics for the circular and rectangular algan/aln/gan heterostructure field-effect transistors (hfets) at low drain-source voltage, we found that the polarization coulomb field scattering has an important influence on the two-dimensional electron gas (2deg) electron mobility in both the circular and rectangular algan/aln/gan hfets. moreover, the polarization coulomb field scattering in algan/aln/gan heterostructures is relatively weaker compared to that in algan/gan heterostructures, which is attributed to the aln interlayer in algan/aln/gan heterostructures to enlarge the average distance between the 2deg electrons and the polarization charges. (c) 2011 american institute of physics. [doi:10.1063/1.3569138]
源URL[http://ir.semi.ac.cn/handle/172111/21275]  
专题半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式
GB/T 7714
Lv YJ,Lin ZJ,Zhang Y,et al. Polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors[J]. applied physics letters,2011,98(12):article no.123512.
APA Lv YJ.,Lin ZJ.,Zhang Y.,Meng LG.,Luan CB.,...&Wang ZG.(2011).Polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors.applied physics letters,98(12),article no.123512.
MLA Lv YJ,et al."Polarization Coulomb field scattering in AlGaN/AlN/GaN heterostructure field-effect transistors".applied physics letters 98.12(2011):article no.123512.

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来源:半导体研究所

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