Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment
文献类型：期刊论文
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| 作者 | Lu XF; Balocco C; Yang FH; Song AM; Lu, XF, Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, Englandxiaofeng.lu@manchester.ac.uk; claudio.balocco@manchester.ac.uk; fhyang@red.semi.ac.cn; a.song@manchester.ac.uk |
| 刊名 | ieee transactions on nanotechnology
 ; IEEE TRANSACTIONS ON NANOTECHNOLOGY
|
| 出版日期 | 2011 ; 2011 |
| 卷号 | 10期号:1页码:53-58 |
| 关键词 | Atomic-force microscope (AFM) nanolithography self-switching diodes (SSDs) 2-D electron gas CONDUCTING POLYMER-FILMS NANOMETER-SCALE LITHOGRAPHY FABRICATION SURFACES DEVICES NANOSTRUCTURES Atomic-force Microscope (Afm) Nanolithography Self-switching Diodes (Ssds) 2-d Electron Gas Conducting Polymer-films Nanometer-scale Lithography Fabrication Surfaces Devices Nanostructures |
| ISSN号 | 1536-125x ; 1536-125X |
| 通讯作者 | lu, xf, univ manchester, sch elect & elect engn, manchester m13 9pl, lancs, englandxiaofeng.lu@manchester.ac.uk ; claudio.balocco@manchester.ac.uk ; fhyang@red.semi.ac.cn ; a.song@manchester.ac.uk |
| 学科主题 | 半导体物理 ; 半导体物理 |
| 收录类别 | SCI |
| 资助信息 | u.k. technology strategy board ; royal society |
| 语种 | 英语 ; 英语 |
| 资助机构 | U.K. Technology Strategy Board ; Royal Society |
| 公开日期 | 2011-07-05 ; 2011-07-15 ; 2011-07-05 |
| 附注 | an approach has been developed to use atomic-force microscope (afm) to pattern materials at the nanoscale in a controlled manner. by introducing a thermal-annealing process above the glass-transition temperature of poly (methylmethacrylate) (pmma), the profile of indented nanopatterns has been dramatically improved by abatement of the tip-induced debris. this eliminates the main problem of the previous afm-based tip-ploughing lithography method, namely the debris formation during the nanoplough and trench refilling by debris. we are able to reproducibly fabricate nanopatterns down to 40 nm. meanwhile, the afm-tip lifetime has been increased substantially. in particular, the adhesion between the pmma layer on the edge of trenches and the substrate is significantly improved to enable reliable pattern transfer into gaas/algaas heterostructures by wet-chemical etching. functional nanodevices with a lateral feature size of 100 nm to an etching depth of 70 nm are demonstrated using the method. |
| 源URL | [http://ir.semi.ac.cn/handle/172111/20901]  |
| 专题 | 半导体研究所_半导体超晶格国家重点实验室 |
| 通讯作者 | Lu, XF, Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, Englandxiaofeng.lu@manchester.ac.uk; claudio.balocco@manchester.ac.uk; fhyang@red.semi.ac.cn; a.song@manchester.ac.uk |
| 推荐引用方式 GB/T 7714 | Lu XF,Balocco C,Yang FH,et al. Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment, Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment[J]. ieee transactions on nanotechnology, IEEE TRANSACTIONS ON NANOTECHNOLOGY,2011, 2011,10, 10(1):53-58, 53-58. |
| APA | Lu XF.,Balocco C.,Yang FH.,Song AM.,Lu, XF, Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, Englandxiaofeng.lu@manchester.ac.uk.,...&a.song@manchester.ac.uk.(2011).Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment.ieee transactions on nanotechnology,10(1),53-58. |
| MLA | Lu XF,et al."Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment".ieee transactions on nanotechnology 10.1(2011):53-58. |
入库方式： OAI收割
来源：半导体研究所
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