中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Deep Energy Levels Formed by Se Implantation in Si

文献类型:期刊论文

作者Han PD
刊名chinese physics letters
出版日期2011
卷号28期号:3页码:article no.36108
ISSN号0256-307x
关键词SILICON PHOTODETECTOR
通讯作者han, pd, chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china. pdhan@semi.ac.cn
学科主题光电子学
资助信息national natural science foundation of china [60776046, 60976046, 60837001, 61021003]; national basic research program of china [2006cb302802, 2010cb933800]
收录类别SCI
语种英语
公开日期2011-07-05 ; 2011-07-15
附注to transfer a photon with a 1.55 mu m wavelength into an electron in an integrated optoelectronic silicon waveguide detector, selenium-doped silicon with deep energy levels is used. the deep levels in the silicon with implanted selenium are studied. three levels are observed and their captured cross sections, concentrations and in-depth profiles are measured.
源URL[http://ir.semi.ac.cn/handle/172111/20989]  
专题半导体研究所_集成光电子学国家重点实验室
推荐引用方式
GB/T 7714
Han PD. Deep Energy Levels Formed by Se Implantation in Si[J]. chinese physics letters,2011,28(3):article no.36108.
APA Han PD.(2011).Deep Energy Levels Formed by Se Implantation in Si.chinese physics letters,28(3),article no.36108.
MLA Han PD."Deep Energy Levels Formed by Se Implantation in Si".chinese physics letters 28.3(2011):article no.36108.

入库方式: OAI收割

来源:半导体研究所

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