The effect of atomic oxygen treatment on the oxygen deficiencies of hafnium oxide films
文献类型：期刊论文
| 作者 | Ma, Z. W.1,2; Xie, Y. Z.1; Liu, L. X.1; Su, Y. R.1; Zhao, H. T.1; Wang, B. Y.3; Qin, X. B.3; Zhang, P.3; Li, J.1; Xie, E. Q.1 |
| 刊名 | Optoelectronics and advanced materials-rapid communications
 |
| 出版日期 | 2010-10-01 |
| 卷号 | 4期号:10页码:1493-1496 |
| 关键词 | Hfo(2) films Atomic oxygen treatment O deficiency |
| ISSN号 | 1842-6573 |
| 通讯作者 | Xie, e. q.(xieeq@lzu.edu.cn) |
| 英文摘要 | We have demonstrated the improvement of hafnium oxide (hfo(2)) films via atomic oxygen post-treatments. the films were characterized using spectroscopic ellipsometry (se), synchrotron x-ray reflectivity (xrr), and doppler broadening spectroscopy (dbs) of positron annihilation radiation. the results indicated that the o deficiencies in hfo(2) films greatly decreased after the treatment. it approved that atomic oxygen post-treatment is an effective method to improve the properties of hfo(2) films. moreover, the proper treatment conditions should be necessary. this research provides a new insight for the preparation of high quality oxide films. |
| WOS关键词 | HFO2 THIN-FILMS ; SPECTROSCOPIC ELLIPSOMETRY ; SPACECRAFT MATERIALS ; POSITRON BEAM ; DEPOSITION ; COATINGS ; DAMAGE ; SI(100) ; LAYER |
| WOS研究方向 | Materials Science ; Optics |
| WOS类目 | Materials Science, Multidisciplinary ; Optics |
| 语种 | 英语 |
| WOS记录号 | WOS:000284126600016 |
| 出版者 | NATL INST OPTOELECTRONICS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2175958 |
| 专题 | 高能物理研究所 |
| 通讯作者 | Xie, E. Q. |
| 作者单位 | 1.Lanzhou Univ, Inst Elect Mat, Sch Phys Sci & Technol, Lanzhou 730000, Peoples R China 2.Yuncheng Univ, Dept Phys & Elect Engn, Yuncheng 044000, Peoples R China 3.Chinese Acad Sci, Key Lab Nucl Anal Tech, Inst High Energy Phys, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Ma, Z. W.,Xie, Y. Z.,Liu, L. X.,et al. The effect of atomic oxygen treatment on the oxygen deficiencies of hafnium oxide films[J]. Optoelectronics and advanced materials-rapid communications,2010,4(10):1493-1496. |
| APA | Ma, Z. W..,Xie, Y. Z..,Liu, L. X..,Su, Y. R..,Zhao, H. T..,...&Xie, E. Q..(2010).The effect of atomic oxygen treatment on the oxygen deficiencies of hafnium oxide films.Optoelectronics and advanced materials-rapid communications,4(10),1493-1496. |
| MLA | Ma, Z. W.,et al."The effect of atomic oxygen treatment on the oxygen deficiencies of hafnium oxide films".Optoelectronics and advanced materials-rapid communications 4.10(2010):1493-1496. |
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