中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Bias effects on the growth of helium-containing titanium films

文献类型:期刊论文

作者Zhang Li-Ran1; Deng Ai-Hong1,2; Yang Dong-Xu1; Zhou Yu-Lu2; Hou Qing2; Shi Li-Qun3; Zhong Yu-Rong4; Wang Bao-Yi4
刊名Chinese physics letters
出版日期2011-07-01
卷号28期号:7页码:4
ISSN号0256-307X
DOI10.1088/0256-307x/28/7/077802
通讯作者Deng ai-hong(ahdeng@scu.edu.cn)
英文摘要Helium-containing titanium films were prepared on si substrates with various biases applied by magnetron sputtering under stable he/ar ambiance. rutherford backscattering and elastic recoil detection analyses are used to measure the thickness of the he-ti films and the helium depth profile, respectively. experiments of x-ray diffraction and variable energy positron annihilation spectroscopy are carried out to investigate the microstructures of titanium films and the corresponding helium-related defects developed. the behavior of the implanted he, the microstructure of the he-ti film and the formation of he-related defects all are affected by the substrate biases applied.
WOS关键词METAL TRITIDES ; VANADIUM ; BUBBLES
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
语种英语
出版者IOP PUBLISHING LTD
WOS记录号WOS:000293141800077
URI标识http://www.irgrid.ac.cn/handle/1471x/2176187
专题高能物理研究所
通讯作者Deng Ai-Hong
作者单位1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
2.Sichuan Univ, Key Lab Radiat Phys & Technol, Inst Nucl Sci & Technol, Minist Educ, Chengdu 610064, Peoples R China
3.Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China
4.Chinese Acad Sci, Inst High Energy Phys, Lab Nucl Anal Tech, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Zhang Li-Ran,Deng Ai-Hong,Yang Dong-Xu,et al. Bias effects on the growth of helium-containing titanium films[J]. Chinese physics letters,2011,28(7):4.
APA Zhang Li-Ran.,Deng Ai-Hong.,Yang Dong-Xu.,Zhou Yu-Lu.,Hou Qing.,...&Wang Bao-Yi.(2011).Bias effects on the growth of helium-containing titanium films.Chinese physics letters,28(7),4.
MLA Zhang Li-Ran,et al."Bias effects on the growth of helium-containing titanium films".Chinese physics letters 28.7(2011):4.

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来源:高能物理研究所

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