Bias effects on the growth of helium-containing titanium films
文献类型:期刊论文
作者 | Zhang Li-Ran1; Deng Ai-Hong1,2; Yang Dong-Xu1; Zhou Yu-Lu2; Hou Qing2; Shi Li-Qun3; Zhong Yu-Rong4; Wang Bao-Yi4 |
刊名 | Chinese physics letters |
出版日期 | 2011-07-01 |
卷号 | 28期号:7页码:4 |
ISSN号 | 0256-307X |
DOI | 10.1088/0256-307x/28/7/077802 |
通讯作者 | Deng ai-hong(ahdeng@scu.edu.cn) |
英文摘要 | Helium-containing titanium films were prepared on si substrates with various biases applied by magnetron sputtering under stable he/ar ambiance. rutherford backscattering and elastic recoil detection analyses are used to measure the thickness of the he-ti films and the helium depth profile, respectively. experiments of x-ray diffraction and variable energy positron annihilation spectroscopy are carried out to investigate the microstructures of titanium films and the corresponding helium-related defects developed. the behavior of the implanted he, the microstructure of the he-ti film and the formation of he-related defects all are affected by the substrate biases applied. |
WOS关键词 | METAL TRITIDES ; VANADIUM ; BUBBLES |
WOS研究方向 | Physics |
WOS类目 | Physics, Multidisciplinary |
语种 | 英语 |
出版者 | IOP PUBLISHING LTD |
WOS记录号 | WOS:000293141800077 |
URI标识 | http://www.irgrid.ac.cn/handle/1471x/2176187 |
专题 | 高能物理研究所 |
通讯作者 | Deng Ai-Hong |
作者单位 | 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 2.Sichuan Univ, Key Lab Radiat Phys & Technol, Inst Nucl Sci & Technol, Minist Educ, Chengdu 610064, Peoples R China 3.Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China 4.Chinese Acad Sci, Inst High Energy Phys, Lab Nucl Anal Tech, Beijing 100049, Peoples R China |
推荐引用方式 GB/T 7714 | Zhang Li-Ran,Deng Ai-Hong,Yang Dong-Xu,et al. Bias effects on the growth of helium-containing titanium films[J]. Chinese physics letters,2011,28(7):4. |
APA | Zhang Li-Ran.,Deng Ai-Hong.,Yang Dong-Xu.,Zhou Yu-Lu.,Hou Qing.,...&Wang Bao-Yi.(2011).Bias effects on the growth of helium-containing titanium films.Chinese physics letters,28(7),4. |
MLA | Zhang Li-Ran,et al."Bias effects on the growth of helium-containing titanium films".Chinese physics letters 28.7(2011):4. |
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来源:高能物理研究所
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