Investigation of titanium nitride films deposited at room temperature by energetic cluster impact
文献类型：期刊论文
| 作者 | Chen, JS; Yu, GQ; Shi, Y; Pan, HC; Zhu, DZ; Zheng, ZH; Xu, HJ; Yan, FN |
| 刊名 | Materials science and engineering b-solid state materials for advanced technology
 |
| 出版日期 | 1999-06-29 |
| 卷号 | 60期号:3页码:200-204 |
| 关键词 | Energetic cluster impact Tinx films Proton elastic scattering |
| ISSN号 | 0921-5107 |
| 通讯作者 | Zhu, dz() |
| 英文摘要 | Energetic cluster impact (ect) deposition was applied to grow titanium nitride films on silicon (100) substrate at room temperature. proton elastic scattering (pes), x-ray diffraction (xrd) and atomic force microscopy (afm) were employed to characterize the composition. structure and morphology of tinx films, respectively. the pes results reveal that the films are n-deficient and there exists a certain amount of oxygen impurity in the films. it is found from the xrd results that the structure of tinx films is sensitive to experimental conditions such as nitrogen gas partial pressure, sputtering current and substrate bias voltage and that tinx films are (220) preferred orientation within some range of experimental conditions. the afm observation indicates that the films become more uniform and compact with increasing substrate bias voltage. the root mean square roughness also decreases with increasing bias voltage. some interpretation for the above results are also given in this paper. (c) 1999 elsevier science s.a. all rights reserved. |
| WOS关键词 | THIN-FILMS ; BEAM DEPOSITION ; TIN ; GROWTH ; ZRN ; HFN |
| WOS研究方向 | Materials Science ; Physics |
| WOS类目 | Materials Science, Multidisciplinary ; Physics, Condensed Matter |
| 语种 | 英语 |
| WOS记录号 | WOS:000081345900008 |
| 出版者 | ELSEVIER SCIENCE SA |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2176293 |
| 专题 | 高能物理研究所 |
| 通讯作者 | Zhu, DZ |
| 作者单位 | 1.Acad Sinica, Shanghai Inst Nucl Res, Lab Nucl Anal Tech, Shanghai 201800, Peoples R China 2.Lanzhou Univ, Dept Modern Phys, Lanzhou 730000, Peoples R China 3.E China Normal Univ, Dept Phys, Shanghai 200062, Peoples R China 4.Acad Sinica, Lanzhou Inst Chem Phys, Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
| 推荐引用方式 GB/T 7714 | Chen, JS,Yu, GQ,Shi, Y,et al. Investigation of titanium nitride films deposited at room temperature by energetic cluster impact[J]. Materials science and engineering b-solid state materials for advanced technology,1999,60(3):200-204. |
| APA | Chen, JS.,Yu, GQ.,Shi, Y.,Pan, HC.,Zhu, DZ.,...&Yan, FN.(1999).Investigation of titanium nitride films deposited at room temperature by energetic cluster impact.Materials science and engineering b-solid state materials for advanced technology,60(3),200-204. |
| MLA | Chen, JS,et al."Investigation of titanium nitride films deposited at room temperature by energetic cluster impact".Materials science and engineering b-solid state materials for advanced technology 60.3(1999):200-204. |
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