Effect of background pressure on co/c multilayers
文献类型：期刊论文
| 作者 | Wen, Mingwu1; Ma, Shuang1; Huang, Qiushi1; Jiang, Li1; Li, Ping1; Zhang, Zhong1; Wang, Zhanshan1; Wang, Delai2; Cui, Mingqi2 |
| 刊名 | Applied optics
 |
| 出版日期 | 2017-02-01 |
| 卷号 | 56期号:4页码:C16-c20 |
| ISSN号 | 1559-128X |
| DOI | 10.1364/ao.56.000c16 |
| 通讯作者 | Wang, zhanshan(wangzs@tongji.edu.cn) |
| 英文摘要 | Co/c multilayers with a period thickness of 3.54 nm and 30 bilayers were deposited by direct current magnetron sputtering with different background pressures. the effects of residual background gases were investigated. the films were characterized by using grazing incidence hard x-ray reflectivity, soft x-ray reflectivity, and x-ray photoelectron spectroscopy. the results indicate that the x-ray reflectivity of co/c multilayers decreases with increasing background pressure as well as the increasing interlayer roughness. the inclusion of more residual background air increases the interdiffusion of co and c layers. (c) 2016 optical society of america |
| WOS关键词 | FILMS ; RADIATION ; EVOLUTION ; MODEL |
| WOS研究方向 | Optics |
| WOS类目 | Optics |
| 语种 | 英语 |
| WOS记录号 | WOS:000394309200003 |
| 出版者 | OPTICAL SOC AMER |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2176693 |
| 专题 | 高能物理研究所 |
| 通讯作者 | Wang, Zhanshan |
| 作者单位 | 1.Tongji Univ, Sch Phys Sci & Engn, MOE Key Lab Adv Microstruct Mat, IPOE, Shanghai 200092, Peoples R China 2.Chinese Acad Sci, Beijing Synchrotron Radiat Facil, Inst High Energy Phys, Beijing 100039, Peoples R China |
| 推荐引用方式 GB/T 7714 | Wen, Mingwu,Ma, Shuang,Huang, Qiushi,et al. Effect of background pressure on co/c multilayers[J]. Applied optics,2017,56(4):C16-c20. |
| APA | Wen, Mingwu.,Ma, Shuang.,Huang, Qiushi.,Jiang, Li.,Li, Ping.,...&Cui, Mingqi.(2017).Effect of background pressure on co/c multilayers.Applied optics,56(4),C16-c20. |
| MLA | Wen, Mingwu,et al."Effect of background pressure on co/c multilayers".Applied optics 56.4(2017):C16-c20. |
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来源：高能物理研究所
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