In situ study on the thermal stability and interfaces properties of er2o3/al2o3/si multi stacked films by x-ray photoelectron spectroscopy
文献类型：期刊论文
| 作者 | Gao, Baolong1; Mamat, Mamatrishat1; Ghupur, Yasenjan1; Ablat, Abduleziz1; Ibrahim, Kurash2; Wang, Jiaou2; Liu, Chen2; Zhao, Jiali2 |
| 刊名 | Superlattices and microstructures
 |
| 出版日期 | 2017-04-01 |
| 卷号 | 104页码:415-421 |
| 关键词 | High-k dielectric Pld Er2o3 Xps |
| ISSN号 | 0749-6036 |
| DOI | 10.1016/j.spmi.2017.02.050 |
| 通讯作者 | Mamat, mamatrishat(mmtrxt@xju.edu.cn) ; Ablat, abduleziz(a_ablat@hotmail.com) |
| 英文摘要 | Ultrathin high-k dielectric films with er2o3/al2o3/si structure were fabricated by the pulsed laser deposition (pld) technique. the samples were annealed in o-2 ambient at the various temperatures. the interface reaction, and as well as the thermal stability between si substrate and er2o3 layer were studied in situ using x-ray photoelectron spectroscopy (xps). the film thickness was measured with scanning electron microscope (sem). the experimental results indicate that the thickness of the silicate layer lessening at the interface with increasing of the thickness of al2o3, and the production of the siox and the silicide is more easily formed than er-silicate after annealing at the lower temperature because of the similarity of the structure and the small lattice mismatch. (c) 2017 elsevier ltd. all rights reserved. |
| WOS关键词 | GATE DIELECTRICS ; THIN-FILMS ; SI(100) |
| WOS研究方向 | Physics |
| WOS类目 | Physics, Condensed Matter |
| 语种 | 英语 |
| WOS记录号 | WOS:000400536000047 |
| 出版者 | ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2177186 |
| 专题 | 高能物理研究所 |
| 通讯作者 | Mamat, Mamatrishat; Ablat, Abduleziz |
| 作者单位 | 1.Xinjiang Univ, Sch Phys Sci & Technol, Urumqi 830046, Peoples R China 2.Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Gao, Baolong,Mamat, Mamatrishat,Ghupur, Yasenjan,et al. In situ study on the thermal stability and interfaces properties of er2o3/al2o3/si multi stacked films by x-ray photoelectron spectroscopy[J]. Superlattices and microstructures,2017,104:415-421. |
| APA | Gao, Baolong.,Mamat, Mamatrishat.,Ghupur, Yasenjan.,Ablat, Abduleziz.,Ibrahim, Kurash.,...&Zhao, Jiali.(2017).In situ study on the thermal stability and interfaces properties of er2o3/al2o3/si multi stacked films by x-ray photoelectron spectroscopy.Superlattices and microstructures,104,415-421. |
| MLA | Gao, Baolong,et al."In situ study on the thermal stability and interfaces properties of er2o3/al2o3/si multi stacked films by x-ray photoelectron spectroscopy".Superlattices and microstructures 104(2017):415-421. |
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