Tribological characteristics of boron nitride nanosheets on silicon wafers obtained by the reaction of MgB2 and NH3
文献类型：期刊论文
| 作者 | Li, Qiulong(李秋龙); Li, Chaowei(李朝威); Zhang, Xiaolong; Songfeng, E.; Li, Zhuo; Ma, Shuanhong; Long, Xiaoyang(龙晓阳); Yao, Yagang(姚亚刚) ; Lu, Weibang(吕卫帮); Geng, Renjie
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| 刊名 | SURFACE & COATINGS TECHNOLOGY
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| 出版日期 | 2018 |
| 其他题名 | Tribological characteristics of boron nitride nanosheets on silicon wafers obtained by the reaction of MgB2 and NH3 |
| 语种 | 英语 |
| 源URL | [http://ir.sinano.ac.cn/handle/332007/6170]  |
| 专题 | 苏州纳米技术与纳米仿生研究所_先进材料研究部_吕卫帮团队 |
| 作者单位 | 中国科学院苏州纳米技术与纳米仿生研究所 |
| 推荐引用方式 GB/T 7714 | Li, Qiulong,Li, Chaowei,Zhang, Xiaolong,et al. Tribological characteristics of boron nitride nanosheets on silicon wafers obtained by the reaction of MgB2 and NH3[J]. SURFACE & COATINGS TECHNOLOGY,2018. |
| APA | Li, Qiulong.,Li, Chaowei.,Zhang, Xiaolong.,Songfeng, E..,Li, Zhuo.,...&Geng, Renjie.(2018).Tribological characteristics of boron nitride nanosheets on silicon wafers obtained by the reaction of MgB2 and NH3.SURFACE & COATINGS TECHNOLOGY. |
| MLA | Li, Qiulong,et al."Tribological characteristics of boron nitride nanosheets on silicon wafers obtained by the reaction of MgB2 and NH3".SURFACE & COATINGS TECHNOLOGY (2018). |
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