Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
文献类型：期刊论文
| 作者 | Zhu, Yafeng; Rong Huang(黄荣); Tong Liu(刘通); Zhao, Yanfei(赵弇斐); Yang Shen(沈阳); Jian Zhang(张鉴); An Dingsun(丁孙安); Yun Guo; Li, Fangsen(李坊森) |
| 刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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| 出版日期 | 2018 |
| 其他题名 | Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity |
| 语种 | 英语 |
| 源URL | [http://ir.sinano.ac.cn/handle/332007/6212]  |
| 专题 | 苏州纳米技术与纳米仿生研究所_大科学装置 |
| 作者单位 | 中国科学院苏州纳米技术与纳米仿生研究所 |
| 推荐引用方式 GB/T 7714 | Zhu, Yafeng,Rong Huang,Tong Liu,et al. Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2018. |
| APA | Zhu, Yafeng.,Rong Huang.,Tong Liu.,Zhao, Yanfei.,Yang Shen.,...&Li, Fangsen.(2018).Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. |
| MLA | Zhu, Yafeng,et al."Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2018). |
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