Fabrication technology of Si face and m face on 4H-SiC (0001) epi-layer based on molten KOH etching
文献类型：期刊论文
| 作者 | Sun, Yu-hua(孙玉华); Lin, Wen-kui(林文魁); Zhang, Xuan; Li, Zhe(李哲); Yang, Tao-tao(杨涛涛); Ju, Tao(鞠涛); Zhang, Bao-shun(张宝顺); Zeng, Chun-hong(曾春红) |
| 刊名 | FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION
 |
| 出版日期 | 2018 |
| 其他题名 | Fabrication technology of Si face and m face on 4H-SiC (0001) epi-layer based on molten KOH etching |
| 语种 | 英语 |
| 源URL | [http://ir.sinano.ac.cn/handle/332007/6322]  |
| 专题 | 苏州纳米技术与纳米仿生研究所_纳米加工公共平台 |
| 作者单位 | 中国科学院苏州纳米技术与纳米仿生研究所 |
| 推荐引用方式 GB/T 7714 | Sun, Yu-hua,Lin, Wen-kui,Zhang, Xuan,et al. Fabrication technology of Si face and m face on 4H-SiC (0001) epi-layer based on molten KOH etching[J]. FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION,2018. |
| APA | Sun, Yu-hua.,Lin, Wen-kui.,Zhang, Xuan.,Li, Zhe.,Yang, Tao-tao.,...&Zeng, Chun-hong.(2018).Fabrication technology of Si face and m face on 4H-SiC (0001) epi-layer based on molten KOH etching.FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION. |
| MLA | Sun, Yu-hua,et al."Fabrication technology of Si face and m face on 4H-SiC (0001) epi-layer based on molten KOH etching".FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION (2018). |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。