Influence of longitudinal mode lock by external grating on filamentation and catastrophic optical mirror damage (COMD) of 970 nm broad area single emitters
文献类型：期刊论文
| 作者 | Li, Deyao(李德尧) ; Tan, Hao; Du, Weichuan; Li, Yi; Meng, Huicheng; Ren, Huaijin; Peng, Jue; Gao, Songxin; Ma, Yi; Li, Ruijun
|
| 刊名 | FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION
 |
| 出版日期 | 2018 |
| 其他题名 | Influence of longitudinal mode lock by external grating on filamentation and catastrophic optical mirror damage (COMD) of 970 nm broad area single emitters |
| 语种 | 英语 |
| 源URL | [http://ir.sinano.ac.cn/handle/332007/6323]  |
| 专题 | 苏州纳米技术与纳米仿生研究所_纳米器件及相关材料研究部_刘建平团队 |
| 作者单位 | 中国科学院苏州纳米技术与纳米仿生研究所 |
| 推荐引用方式 GB/T 7714 | Li, Deyao,Tan, Hao,Du, Weichuan,et al. Influence of longitudinal mode lock by external grating on filamentation and catastrophic optical mirror damage (COMD) of 970 nm broad area single emitters[J]. FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION,2018. |
| APA | Li, Deyao.,Tan, Hao.,Du, Weichuan.,Li, Yi.,Meng, Huicheng.,...&Zhou, Kun.(2018).Influence of longitudinal mode lock by external grating on filamentation and catastrophic optical mirror damage (COMD) of 970 nm broad area single emitters.FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION. |
| MLA | Li, Deyao,et al."Influence of longitudinal mode lock by external grating on filamentation and catastrophic optical mirror damage (COMD) of 970 nm broad area single emitters".FOURTH SEMINAR ON NOVEL OPTOELECTRONIC DETECTION TECHNOLOGY AND APPLICATION (2018). |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。