Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting
文献类型：期刊论文
| 作者 | Hu X(胡勋); Yinhe Lin; Zhang K(张侃); Wenbing Shi; Jiali Liu; Ma Y(马英) ; 汪忠浩#; 贾玉龙#
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| 刊名 | Electrochimica Acta
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| 出版日期 | 2019 |
| 卷号 | 300期号:0页码:138e144 |
| 源URL | [http://210.77.64.217/handle/362003/24929]  |
| 专题 | 兰州化学物理研究所_ERC国家工程研究中心 |
| 通讯作者 | Zhang K(张侃); Ma Y(马英) |
| 作者单位 | 1.National Engineering Research Center for Fine Petrochemical Intermediates, State Key Laboratory for Oxo Synthesis and Selective Oxidation, Lanzhou, China 2.School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, China 3.School of Chemistry and Chemical Engineering, Yangtze Normal University, Chongqing, 408000, China |
| 推荐引用方式 GB/T 7714 | Hu X,Yinhe Lin,Zhang K,et al. Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting[J]. Electrochimica Acta,2019,300(0):138e144. |
| APA | Hu X.,Yinhe Lin.,Zhang K.,Wenbing Shi.,Jiali Liu.,...&贾玉龙#.(2019).Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting.Electrochimica Acta,300(0),138e144. |
| MLA | Hu X,et al."Boosting interfacial charge migration of TiO2/BiVO4 photoanode by W doping for photoelectrochemical water splitting".Electrochimica Acta 300.0(2019):138e144. |
入库方式： OAI收割
来源：兰州化学物理研究所
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