Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification
文献类型：期刊论文
| 作者 | Zhang, Zhiqiang1; Duan, Huigao2; Tang, Yuguo1; Li, Haiwen1; Wu, Yihui1; Zhou, Wuping3; Liu, Cong1 |
| 刊名 | Microelectronic Engineering
 |
| 出版日期 | 2014 |
| DOI | Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification |
| 源URL | [http://ir.sibet.ac.cn/handle/154232/361]  |
| 专题 | 医学检验技术研究室 |
| 作者单位 | 1.CAS Key Lab of Bio-Medical Diagnostics,Suzhou Institute of Biomedical Engineering and Technology,Chinese Academy of Sciences 2.College of Physics and Microelectronics,Hunan University 3.State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences |
| 推荐引用方式 GB/T 7714 | Zhang, Zhiqiang,Duan, Huigao,Tang, Yuguo,et al. Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification[J]. Microelectronic Engineering,2014. |
| APA | Zhang, Zhiqiang.,Duan, Huigao.,Tang, Yuguo.,Li, Haiwen.,Wu, Yihui.,...&Liu, Cong.(2014).Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification.Microelectronic Engineering. |
| MLA | Zhang, Zhiqiang,et al."Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification".Microelectronic Engineering (2014). |
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